Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE38256 | Photosensitive composition | Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu +1 more | 2003-09-23 |
| RE35821 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato +2 more | 1998-06-09 |
| 5744281 | Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive | Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato +2 more | 1998-04-28 |
| 5691101 | Photosensitive composition | Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu +1 more | 1997-11-25 |
| 5658706 | Resist composition for forming a pattern comprising a pyridinium compound as an additive | Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato +2 more | 1997-08-19 |
| 5580702 | Method for forming resist patterns | Rumiko Hayase, Yasunobu Onishi, Noahiko Oyasato, Yoshihito Kobayashi, Shuzi Nayase | 1996-12-03 |
| 5432023 | Fuel cell | Shuji Yamada, Motoya Kanda, Masao Yamamoto, Nobukazu Suzuki, Yoshiko Kanazawa +6 more | 1995-07-11 |
| 5403695 | Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups | Rumiko Hayase, Yasunobu Onishi, Naohiko Oyasato, Yoshihito Kobayashi, Shuzi Hayase | 1995-04-04 |
| 5372914 | Pattern forming method | Takuya Naito, Osamu Sasaki, Tsukasa Tada, Naoko Kihara, Toru Ushirogouchi +2 more | 1994-12-13 |
| 5364711 | Fuel cell | Shuji Yamada, Motoya Kanda, Masao Yamamoto, Nobukazu Suzuki, Yoshiko Kanazawa +6 more | 1994-11-15 |
| 5326675 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato +2 more | 1994-07-05 |
| 5279921 | Pattern formation resist and pattern formation method | Yasunobu Onishi, Yoshihito Kobayashi | 1994-01-18 |
| 5188924 | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt | Kunihiro Ikari, Makoto Nakase, Toshiaki Shinozaki | 1993-02-23 |
| 5100768 | Photosensitive composition | Yasunobu Onishi, Yoshihito Kobayashi, Rumiko Hayase | 1992-03-31 |
| 5091282 | Alkali soluble phenol polymer photosensitive composition | Yasunobu Onishi, Yoshihito Kobayashi, Rumiko Hayase, Toru Ushirogouchi | 1992-02-25 |