Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE38256 | Photosensitive composition | Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu +1 more | 2003-09-23 |
| 6410748 | Alicycli c group-containing monomer | Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase +1 more | 2002-06-25 |
| 6291129 | Monomer, high molecular compound and photosensitive composition | Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase +1 more | 2001-09-18 |
| 6280897 | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts | Koji Asakawa, Naoko Kihara, Naomi Shida, Toru Ushirogouchi, Takeshi Okino +2 more | 2001-08-28 |
| 6228552 | Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material | Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi | 2001-05-08 |
| 6168897 | Method of forming patterns | Toru Ushirogouchi, Takuya Naito, Koji Asakawa | 2001-01-02 |
| 6071670 | Transparent resin, photosensitive composition, and method of forming a pattern | Toru Ushirogouchi, Takeshi Okino, Naomi Shida, Yoshiaki Kawamonzen, Rumiko Hayase +1 more | 2000-06-06 |
| 6060207 | Photosensitive material | Naomi Shida, Toru Ushirogouchi, Takuya Naito | 2000-05-09 |
| 6045968 | Photosensitive composition | Toru Ushirogouchi, Koji Asakawa, Naomi Shida, Takeshi Okino | 2000-04-04 |
| 5932391 | Resist for alkali development | Toru Ushirogouchi, Koji Asakawa, Naoko Kihara, Naomi Shida, Takeshi Okino | 1999-08-03 |
| 5928841 | Method of photoetching at 180 to 220 | Toru Ushirogouchi, Takuya Naito, Koji Asakawa | 1999-07-27 |
| 5863699 | Photo-sensitive composition | Koji Asakawa, Toru Ushirogochi, Naomi Shida | 1999-01-26 |
| 5853952 | Color developing organic material, color developing resin composition and colored thin film pattern | Toru Ushirogouchi, Akira Yoshizumi, Naoko Kihara, Takuya Naito, Naomi Shida +1 more | 1998-12-29 |
| 5837405 | Reticle | Yoko Tomofuji, Takashi Sato, Hiroaki Hazama, Haruki Komano, Shinichi Ito | 1998-11-17 |
| 5837419 | Photosensitive composition | Toru Ushirogouchi, Koji Asakawa, Naomi Shida, Takeshi Okino | 1998-11-17 |
| 5756254 | Resist, method of forming a resist pattern and manufacturing an electronic parts using the resist | Naoko Kihara, Satoshi Saito, Hiromitsu Wakabayashi, Masayuki Oba | 1998-05-26 |
| 5691101 | Photosensitive composition | Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu +1 more | 1997-11-25 |
| 5660956 | Reticle and method of fabricating reticle | Yoko Tomofuji, Takashi Sato, Hiroaki Hazama, Haruki Komano, Shinichi Ito | 1997-08-26 |
| 5595844 | Method of exposing light in a method of fabricating a reticle | Yoko Tomofuji, Takashi Sato, Hiroaki Hazama, Haruki Komano, Shinichi Ito | 1997-01-21 |
| 5589305 | Method of fabricating a reticle | Yoko Tomofuji, Takashi Sato, Hiroaki Hazama, Haruki Komano, Shinichi Ito | 1996-12-31 |
| 5407786 | Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation | Shinishi Ito, Haruo Okano | 1995-04-18 |
| 5358808 | Exposure mask, method of manufacturing the same, and exposure method using the same | Akihiro Nitayama, Kouji Hishimoto, Hirotsugu Wada | 1994-10-25 |
| 5234780 | Exposure mask, method of manufacturing the same, and exposure method using the same | Akihiro Nitayama, Kouji Hashimoto, Hirotsugu Wada | 1993-08-10 |
| 5188924 | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt | Kunihiro Ikari, Hirokazu Niki, Toshiaki Shinozaki | 1993-02-23 |