Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5188924 | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt | Kunihiro Ikari, Hirokazu Niki, Makoto Nakase | 1993-02-23 |
| 5051338 | Method and apparatus for forming resist pattern | Yoshihide Kato, Kei Kirita, Fumiaki Shigemitsu, Kinya Usuda, Takashi Tsuchiya | 1991-09-24 |
| 4897337 | Method and apparatus for forming resist pattern | Yoshihide Kato, Kei Kirita, Fumiaki Shigemitsu, Kinya Usuda, Takashi Tsuchiya | 1990-01-30 |
| 4748327 | Method of inspecting masks and apparatus thereof | Sadao Sasaki | 1988-05-31 |
| 4717645 | Method and apparatus for forming resist pattern | Yoshihide Kato, Kei Kirita, Fumiaki Shigemitsu, Kinya Usuda, Takashi Tsuchiya | 1988-01-05 |
| 4572956 | Electron beam pattern transfer system having an autofocusing mechanism | Toru Tojo, Ichiro Mori, Kazuyoshi Sugihara, Mitsuo Tabata, Chikara Itoh | 1986-02-25 |
| 4560278 | Fixed-slit type photoelectric microscope | Ichiro Mori | 1985-12-24 |
| 4469949 | Electron beam pattern transfer device and method for aligning mask and semiconductor wafer | Ichiro Mori, Kazuyoshi Sugihara, Toru Tojo | 1984-09-04 |
| 4467210 | Electron-beam image transfer device | Kazuyoshi Sugihara, Toru Tojo, Ichiro Mori | 1984-08-21 |
| 4411013 | System for transferring a fine pattern onto a target | Shinichiro Takasu | 1983-10-18 |
| 4366383 | Electron beam type pattern transfer apparatus | Shunichi Sano, Ichiro Mori | 1982-12-28 |
| 4269653 | Aperture stop | Hirotsugu Wada | 1981-05-26 |
| 4218621 | Electron beam exposure apparatus | Mamoru Nakasuji | 1980-08-19 |