Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6649310 | Method of manufacturing photomask | Masamitsu Itoh, Shigeki Nojima, Osamu Ikenaga | 2003-11-18 |
| 6632592 | Resist pattern forming method | — | 2003-10-14 |
| 6418553 | Circuit designing method for semiconductor device and computer-readable medium | Akiko Yamada, Koji Hashimoto | 2002-07-09 |
| 6294297 | Computer program product for calculating a process tolerance relating exposure amount and focal point position | — | 2001-09-25 |
| 6252651 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Akiko Mimotogi, Soichi Inoue | 2001-06-26 |
| 6249900 | Method of designing an LSI pattern to be formed on a specimen with a bent portion | Toshiya Kotani, Soichi Inoue, Kazuko Yamamoto | 2001-06-19 |
| 6225033 | Method of forming a resist pattern | Yasunobu Onishi, Kentaro Matsunaga, Katsuya Okumura | 2001-05-01 |
| 6107013 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Akiko Mimotogi, Soichi Inoue | 2000-08-22 |
| 6045981 | Method of manufacturing semiconductor device | Kentaro Matsunaga, Akiko Mimotogi, Soichi Inoue | 2000-04-04 |
| 5906903 | Process tolerance calculating method relating exposure amount and focal point position to allowable dimension value | — | 1999-05-25 |
| 5889678 | Topography simulation method | Soichi Inoue, Satoshi Tanaka, Yasunobu Onishi | 1999-03-30 |
| 5889686 | Profile simulation method | Soichi Inoue | 1999-03-30 |
| 5876885 | Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation | Soichi Inoue, Akiko Mimotogi | 1999-03-02 |
| 5745388 | Profile simulation method and pattern design method | Soichi Inoue | 1998-04-28 |
| 5733687 | Photomask, exposing method using photomask, and manufacturing method of photomask | Satoshi Tanaka, Tadahito Fujisawa, Soichi Inoue | 1998-03-31 |