Issued Patents All Time
Showing 51–75 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7094504 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Kyoko Izuha, Hideki Kanai, Shingo Kanamitsu, Shinichi Ito | 2006-08-22 |
| 7090949 | Method of manufacturing a photo mask and method of manufacturing a semiconductor device | Shigeki Nojima, Shoji Mimotogi, Satoshi Tanaka, Toshiya Kotani, Shigeru Hasebe +2 more | 2006-08-15 |
| 7061603 | Method for inspecting exposure apparatus | Kazuya Sato | 2006-06-13 |
| 7029799 | Exposure method for forming pattern for IC chips on reticle by use of master masks | Suigen Kyoh | 2006-04-18 |
| 7018932 | Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device | Shinichi Ito, Tatsuhiko Higashiki, Katsuya Okumura, Kenji Kawano | 2006-03-28 |
| 6990225 | Inspection method of photo mask for use in manufacturing semiconductor device | Satoshi Tanaka | 2006-01-24 |
| 6972836 | Measuring method of illuminance unevenness of exposure apparatus, correcting method of illuminance unevenness, manufacturing method of semiconductor device, and exposure apparatus | Kazuya Sato, Satoshi Tanaka | 2005-12-06 |
| 6967719 | Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device | Takashi Sato, Shoji Mimotogi, Takahiro Ikeda | 2005-11-22 |
| 6964031 | Mask pattern generating method and manufacturing method of semiconductor apparatus | Toshiya Kotani, Satoshi Tanaka, Sachiko Kobayashi, Hirotaka Ichiakwa | 2005-11-08 |
| 6919153 | Dose monitoring method and manufacturing method of semiconductor device | Tadahito Fujisawa, Takashi Sato, Masafumi Asano | 2005-07-19 |
| 6901577 | Pattern forming method and semiconductor device manufactured by using said pattern forming method | Toshiya Kotani, Satoshi Tanaka | 2005-05-31 |
| 6866976 | Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit | Masafumi Asano, Nobuhiro Komine | 2005-03-15 |
| 6853743 | Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium | Toshiya Kotani, Satoshi Tanaka | 2005-02-08 |
| 6806941 | Pattern forming method and pattern forming apparatus | Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2004-10-19 |
| 6760101 | Method for inspecting exposure apparatus | Kazuya Sato | 2004-07-06 |
| 6727028 | Pattern formation method, mask for exposure used for pattern formation, and method of manufacturing the same | Toshiya Kotani, Satoshi Tanaka | 2004-04-27 |
| 6701512 | Focus monitoring method, exposure apparatus, and exposure mask | Takumichi Sutani, Tadahito Fujisawa, Takashi Sato, Takashi Sakamoto, Masafumi Asano | 2004-03-02 |
| 6622296 | Exposure mask pattern correction method, pattern formation method, and a program product for operating a computer | Koji Hashimoto, Satoshi Tanaka, Satoshi Usui | 2003-09-16 |
| 6610448 | Alignment method, overlay deviation inspection method and photomask | Takashi Sato | 2003-08-26 |
| 6567972 | Method and apparatus for correcting mask pattern, mask having corrected mask pattern, and storage medium storing program for executing the method for correcting mask pattern | Satoshi Tanaka | 2003-05-20 |
| 6542237 | Exposure method for making precision patterns on a substrate | Suigen Kyoh, Iwao Higashikawa | 2003-04-01 |
| 6536032 | Method of processing exposure mask-pattern data, simulation using this method, and recording medium | Satoshi Tanaka | 2003-03-18 |
| 6507931 | Semiconductor integrated circuit designing method and system | Toshiya Kotani, Satoshi Tanaka | 2003-01-14 |
| 6440616 | Mask and method for focus monitoring | Kyoko Izuha, Tadahito Fujisawa | 2002-08-27 |
| 6423977 | Pattern size evaluation apparatus | Kei Hayasaki, Shinichi Ito, Kenji Kawano, Katsuya Okumura | 2002-07-23 |