Issued Patents All Time
Showing 26–50 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7541136 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Kyoko Izuha, Hideki Kanai, Shingo Kanamitsu, Shinichi Ito | 2009-06-02 |
| 7526748 | Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium | Toshiya Kotani, Satoshi Tanaka, Shigeki Nojima | 2009-04-28 |
| 7523437 | Pattern-producing method for semiconductor device | Suigen Kyoh, Toshiya Kotani | 2009-04-21 |
| 7506301 | Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device | Toshiya Kotani, Satoshi Tanaka | 2009-03-17 |
| 7499582 | Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask | Toshiya Kotani, Suigen Kyoh, Shinji Yamaguchi | 2009-03-03 |
| 7482661 | Pattern forming method and semiconductor device manufactured by using said pattern forming method | Toshiya Kotani, Satoshi Tanaka | 2009-01-27 |
| 7474386 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2009-01-06 |
| 7473495 | Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product | Satoshi Tanaka, Koji Hashimoto, Shigeru Hasebe | 2009-01-06 |
| 7396621 | Exposure control method and method of manufacturing a semiconductor device | Tadahito Fujisawa, Satoshi Tanaka, Masafumi Asano | 2008-07-08 |
| 7371483 | Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device | Shingo Kanamitsu, Takashi Hirano, Kyoko Izuha, Shinichi Ito | 2008-05-13 |
| 7365830 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2008-04-29 |
| 7353145 | Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device | Satoshi Tanaka | 2008-04-01 |
| 7327449 | Exposure apparatus inspection method and exposure apparatus | Kazuya Fukuhara | 2008-02-05 |
| 7295304 | Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, defect influence map generating method, and computer program product | Shinji Yamaguchi, Satoshi Tanaka, Mari Inoue | 2007-11-13 |
| 7286216 | Exposure apparatus inspection method and exposure apparatus | Kazuya Fukuhara | 2007-10-23 |
| 7248349 | Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device | Takashi Sato, Shoji Mimotogi, Takahiro Ikeda | 2007-07-24 |
| 7230680 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2007-06-12 |
| 7208423 | Semiconductor device fabrication method and semiconductor device | Koji Hashimoto, Kazuhiro Takahata, Kei Yoshikawa | 2007-04-24 |
| 7194704 | Design layout preparing method | Toshiya Kotani, Shigeki Nojima, Suigen Kyoh, Kyoko Izuha, Ryuji Ogawa +2 more | 2007-03-20 |
| 7186485 | Inspection method and a photomask | Kazuya Fukuhara, Satoshi Tanaka | 2007-03-06 |
| 7181707 | Method of setting process parameter and method of setting process parameter and/or design rule | Toshiya Kotani, Satoshi Tanaka, Koji Hashimoto, Ichiro Mori | 2007-02-20 |
| 7148138 | Method of forming contact hole and method of manufacturing semiconductor device | Shoji Mimotogi, Hiroko Nakamura, Kazuya Fukuhara, Satoshi Tanaka | 2006-12-12 |
| 7139998 | Photomask designing method, pattern predicting method and computer program product | Kazuya Fukuhara, Tatsuhiko Higashiki | 2006-11-21 |
| 7120882 | Method of setting process parameter and method of setting process parameter and/or design rule | Toshiya Kotani, Satoshi Tanaka, Koji Hashimoto, Ichiro Mori | 2006-10-10 |
| 7108945 | Photomask having a focus monitor pattern | Takumichi Sutani, Kyoko Izuha, Tadahito Fujisawa | 2006-09-19 |