Issued Patents All Time
Showing 76–100 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6376139 | Control method for exposure apparatus and control method for semiconductor manufacturing apparatus | Tadahito Fujisawa, Kenji Kawano, Shinichi Ito, Ichiro Mori | 2002-04-23 |
| 6340542 | Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask | Suigen Kyoh, Iwao Higashikawa, Ichiro Mori | 2002-01-22 |
| 6335145 | Pattern forming method and pattern forming apparatus | Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2002-01-01 |
| 6317198 | Method of examining an exposure tool | Kazuya Sato, Satoshi Tanaka, Tadahito Fujisawa | 2001-11-13 |
| 6316163 | Pattern forming method | Shunko Magoshi, Masamitsu Itoh, Shinji Sato, Kazuyoshi Sugihara, Katsuya Okumura | 2001-11-13 |
| 6251544 | Exposure dose measuring method and exposure dose measuring mask | Shinichi Ito, Kei Hayasaki | 2001-06-26 |
| 6252651 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Akiko Mimotogi, Shoji Mimotogi | 2001-06-26 |
| 6249900 | Method of designing an LSI pattern to be formed on a specimen with a bent portion | Toshiya Kotani, Shoji Mimotogi, Kazuko Yamamoto | 2001-06-19 |
| 6245466 | Mask pattern design method and a photomask | Toshiya Kotani, Satoshi Tanaka | 2001-06-12 |
| 6226074 | Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices | Tadahito Fujisawa, Hiroshi Nomura, Ichiro Mori | 2001-05-01 |
| 6221539 | Mask pattern correction method and a recording medium which records a mask pattern correction program | Toshiya Kotani, Satoshi Tanaka | 2001-04-24 |
| 6180293 | Mask pattern preparing method and photomask | Satoshi Tanaka, Toshiya Kotani | 2001-01-30 |
| 6165652 | Pattern forming method and pattern forming apparatus | Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2000-12-26 |
| 6159642 | Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask | Kenji Kawano, Shinichi Ito, Satoshi Tanaka, Hideki Kanai, Ikuo Yoneda | 2000-12-12 |
| 6110647 | Method of manufacturing semiconductor device | Hisashi Kaneko, Masahiko Hasunuma, Takamasa Usui, Masami Aoki, Kazuko Yamamoto +1 more | 2000-08-29 |
| 6107013 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Akiko Mimotogi, Shoji Mimotogi | 2000-08-22 |
| 6077310 | Optical proximity correction system | Kazuko Yamamoto, Sachiko Miyama, Kiyomi Koyama | 2000-06-20 |
| 6060368 | Mask pattern correction method | Koji Hashimoto, Hisako Aoyama, Kazuko Yamamoto, Sachiko Kobayashi | 2000-05-09 |
| 6045981 | Method of manufacturing semiconductor device | Kentaro Matsunaga, Akiko Mimotogi, Shoji Mimotogi | 2000-04-04 |
| 6040114 | Pattern forming method | Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2000-03-21 |
| 5889678 | Topography simulation method | Satoshi Tanaka, Shoji Mimotogi, Yasunobu Onishi | 1999-03-30 |
| 5889686 | Profile simulation method | Shoji Mimotogi | 1999-03-30 |
| 5879844 | Optical proximity correction method | Kazuko Yamamoto, Sachiko Miyama, Kiyomi Koyama | 1999-03-09 |
| 5876885 | Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation | Shoji Mimotogi, Akiko Mimotogi | 1999-03-02 |
| 5866280 | Exposure mask and manufacturing method thereof | Shinichi Ito, Kenji Kawano, Satoshi Tanaka | 1999-02-02 |