SI

Soichi Inoue

KT Kabushiki Kaisha Toshiba: 114 patents #60 of 21,451Top 1%
NI Nikon: 3 patents #1,048 of 2,493Top 45%
SC Shin-Etsu Handotai Co.: 3 patents #210 of 679Top 35%
Toshiba Memory: 2 patents #853 of 1,971Top 45%
MC Mitsubishi Chemical: 2 patents #163 of 716Top 25%
Dai Nippon Printing Co.: 1 patents #1,392 of 2,222Top 65%
Overall (All Time): #10,383 of 4,157,543Top 1%
118
Patents All Time

Issued Patents All Time

Showing 101–118 of 118 patents

Patent #TitleCo-InventorsDate
5861866 LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography Satoshi Tanaka 1999-01-19
5783336 Mask for exposure Masami Aoki, Yusuke Kohyama, Akiko Nikki 1998-07-21
5745388 Profile simulation method and pattern design method Shoji Mimotogi 1998-04-28
5733687 Photomask, exposing method using photomask, and manufacturing method of photomask Satoshi Tanaka, Shoji Mimotogi, Tadahito Fujisawa 1998-03-31
5707501 Filter manufacturing apparatus Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi, Keiji Horioka 1998-01-13
5686209 Phase shifting mask and method of forming a pattern using the same Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Hiroyuki Sato +2 more 1997-11-11
5673103 Exposure apparatus and method Satoshi Tanaka, Tadahito Fujisawa 1997-09-30
5639699 Focused ion beam deposition using TMCTS Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more 1997-06-17
5633713 Method and system for evaluating distribution of absorption light amount in optical lithography Satoshi Tanaka 1997-05-27
5627626 Projectin exposure apparatus Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi, Keiji Horioka 1997-05-06
5621498 Projection exposure apparatus Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi, Keiji Horioka 1997-04-15
5609977 Reflection phase shifting mask and method of forming a pattern using the same Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Hiroyuki Sato +2 more 1997-03-11
5549995 Photomask and method of manufacturing the same Satoshi Tanaka, Hiroko Nakamura 1996-08-27
5514499 Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Hiroyuki Sato +2 more 1996-05-07
5429730 Method of repairing defect of structure Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more 1995-07-04
5422205 Micropattern forming method Ichiro Mori, Tsuyoshi Shibata 1995-06-06
4490320 Process for preparing a calcium silicate shaped product Yasuo Oguri, Mitsuru Awata, Junji Saito, Noriyuki Ariyama 1984-12-25
4427611 Process for preparing calcium silicate shaped product Yasuo Oguri, Mitsuru Awata, Junji Saito, Tatsuo Andio, Mitsunobu Abe 1984-01-24