Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9368314 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2016-06-14 |
| 8803103 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2014-08-12 |
| 8611638 | Pattern inspection method and pattern inspection apparatus | — | 2013-12-17 |
| 8368031 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2013-02-05 |
| 8124933 | Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample | Kenji Watanabe, Takeshi Murakami, Masahiro Hatakeyama, Yoshinao Hirabayashi, Tohru Satake +2 more | 2012-02-28 |
| 8067732 | Electron beam apparatus | Mamoru Nakasuji, Takeshi Murakami, Tohru Satake, Tsutomi Karimata, Toshifumi Kimba +4 more | 2011-11-29 |
| 8053726 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2011-11-08 |
| 8035082 | Projection electron beam apparatus and defect inspection system using the apparatus | Yuichiro Yamazaki | 2011-10-11 |
| 7863580 | Electron beam apparatus and an aberration correction optical apparatus | Masahiro Hatakeyama, Takeshi Murakami, Nobuharu Noji, Mamoru Nakasuji, Hirosi Sobukawa +3 more | 2011-01-04 |
| 7847250 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Yuichiro Yamazaki, Takamitsu Nagai, Motosuke Miyoshi | 2010-12-07 |
| 7838831 | Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method | — | 2010-11-23 |
| 7674570 | Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device | Yuichiro Yamazaki, Atsushi Onishi | 2010-03-09 |
| 7645988 | Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus | Yuichiro Yamazaki, Atsushi Onishi | 2010-01-12 |
| 7608821 | Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method | Yuichiro Yamazaki, Atsushi Onishi | 2009-10-27 |
| 7592586 | Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample | Kenji Watanabe, Takeshi Murakami, Masahiro Hatakeyama, Yoshinao Hirabayashi, Tohru Satake +2 more | 2009-09-22 |
| 7569838 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2009-08-04 |
| 7462829 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Yuichiro Yamazaki, Takamitsu Nagai, Motosuke Miyoshi | 2008-12-09 |
| 7449691 | Detecting apparatus and device manufacturing method | Masahiro Hatakeyama, Takeshi Murakami, Tohru Satake, Nobuharu Noji, Yuichiro Yamazaki | 2008-11-11 |
| 7411191 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2008-08-12 |
| 7351969 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2008-04-01 |
| 7352195 | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus | Kenji Watanabe, Tohru Satake, Nobuharu Noji, Takeshi Murakami, Tsutomu Karimata +2 more | 2008-04-01 |
| 7241993 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2007-07-10 |
| 7212017 | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus | Kenji Watanabe, Tohru Satake, Nobuharu Noji, Takeshi Murakami, Tsutomu Karimata +2 more | 2007-05-01 |
| 7211796 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Yuichiro Yamazaki, Takamitsu Nagai, Motosuke Miyoshi | 2007-05-01 |
| 7148479 | Defect inspection apparatus, program, and manufacturing method of semiconductor device | Atsushi Onishi, Yuichiro Yamazaki | 2006-12-12 |