Issued Patents All Time
Showing 51–74 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6525328 | Electron beam lithography system and pattern writing method | Motosuke Miyoshi, Katsuya Okumura | 2003-02-25 |
| 6512237 | Charged beam exposure method and charged beam exposure apparatus | Tetsuro Nakasugi, Hideaki Abe | 2003-01-28 |
| 6495841 | Charged beam drawing apparatus | Atsushi Ando, Shunko Magoshi, Kazuyoshi Sugihara, Motosuke Miyoshi, Katsuya Okumura +1 more | 2002-12-17 |
| 6376136 | Charged beam exposure method | Tetsuro Nakasugi, Hideaki Abe | 2002-04-23 |
| 6265719 | Inspection method and apparatus using electron beam | Takamitsu Nagai, Motosuke Miyoshi | 2001-07-24 |
| 6259094 | Electron beam inspection method and apparatus | Takamitsu Nagai, Motosuke Miyoshi | 2001-07-10 |
| 6181501 | Information recording and reproducing apparatus having an improved high frequency characteristic for a reproduction signal | — | 2001-01-30 |
| 6171760 | Lithographic method utilizing charged particle beam exposure and fluorescent film | Motosuke Miyoshi | 2001-01-09 |
| 6038018 | Substrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting method | Motosuke Miyoshi | 2000-03-14 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1997-06-17 |
| 5639308 | Plasma apparatus | Motosuke Miyoshi, Katsuya Okumura | 1997-06-17 |
| 5576833 | Wafer pattern defect detection method and apparatus therefor | Motosuke Miyoshi | 1996-11-19 |
| 5548183 | Magnetic field immersion type electron gun | Motosuke Miyoshi, Katsuya Okumura | 1996-08-20 |
| 5539211 | Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus | Kenji Ohtoshi, Itsuko Sakai, Jun Takamatsu, Munehiro Ogasawara, Kazuyoshi Sugihara | 1996-07-23 |
| 5535508 | Method for producing an electrostatic lens | Takamitsu Nagai, Motosuke Miyoshi | 1996-07-16 |
| 5444256 | Electrostatic lens and method for producing the same | Takamitsu Nagai, Motosuke Miyoshi | 1995-08-22 |
| 5429730 | Method of repairing defect of structure | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1995-07-04 |
| 5413663 | Plasma processing apparatus | Masahiro Shimizu, Takayuki Fukasawa, Motosuke Miyoshi, Haruo Okano, Katsuya Okumura | 1995-05-09 |
| 5406178 | Pulse beam forming method and apparatus | — | 1995-04-11 |
| 5371371 | Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens | Motosuke Miyoshi, Takamitsu Nagai | 1994-12-06 |
| 5362968 | Optic column having particular major/minor axis magnification ratio | Motosuke Miyoshi, Katsuya Okumura | 1994-11-08 |
| 5293045 | Electrostatic lens | Motosuke Miyoshi, Katsuya Okumura | 1994-03-08 |
| 5138169 | Method and apparatus for irradiating low-energy electrons | Motosuke Miyoshi, Katsuya Okumura | 1992-08-11 |
| 4902131 | Surface inspection method and apparatus therefor | Motosuke Miyoshi, Shigeru Ogawa, Katsuya Okumura | 1990-02-20 |