Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7504625 | Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus | — | 2009-03-17 |
| 7483155 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus | Kei Hayasaki, Toru Mikami, Shinichi Ito, Toshiya Kotani | 2009-01-27 |
| 7462829 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Takamitsu Nagai, Motosuke Miyoshi | 2008-12-09 |
| 7449691 | Detecting apparatus and device manufacturing method | Masahiro Hatakeyama, Takeshi Murakami, Tohru Satake, Nobuharu Noji, Ichirota Nagahama | 2008-11-11 |
| 7417814 | Magnetic recording device | — | 2008-08-26 |
| 7411191 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2008-08-12 |
| 7352195 | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus | Kenji Watanabe, Tohru Satake, Nobuharu Noji, Takeshi Murakami, Tsutomu Karimata +2 more | 2008-04-01 |
| 7351969 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2008-04-01 |
| 7241993 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2007-07-10 |
| 7211796 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Takamitsu Nagai, Motosuke Miyoshi | 2007-05-01 |
| 7212017 | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus | Kenji Watanabe, Tohru Satake, Nobuharu Noji, Takeshi Murakami, Tsutomu Karimata +2 more | 2007-05-01 |
| 7148479 | Defect inspection apparatus, program, and manufacturing method of semiconductor device | Atsushi Onishi, Ichirota Nagahama | 2006-12-12 |
| 7098457 | Electron beam apparatus and device manufacturing method using same | Ichirota Nagahama, Kenji Watanabe, Masahiro Hatakeyama, Tohru Satake, Nobuharu Noji | 2006-08-29 |
| 7081756 | Substrate inspection apparatus, substrate inspection method, method of manufacturing semiconductor device and recording medium | Hiroyuki Hayashi | 2006-07-25 |
| 7075072 | Detecting apparatus and device manufacturing method | Masahiro Hatakeyama, Takeshi Murakami, Tohru Satake, Nobuharu Noji, Ichirota Nagahama | 2006-07-11 |
| 7009793 | Magnetic disk apparatus, read gate optimization method and program | — | 2006-03-07 |
| 6992290 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2006-01-31 |
| 6991878 | Photomask repair method and apparatus | Shingo Kanamitsu, Takashi Hirano, Fumiaki Shigemitsu, Motosuke Miyoshi, Kazuyoshi Sugihara +4 more | 2006-01-31 |
| 6940080 | Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device | Osamu Nagano, Susumu Hashimoto, Atsushi Ando | 2005-09-06 |
| 6909092 | Electron beam apparatus and device manufacturing method using same | Ichirota Nagahama, Kenji Watanabe, Masahiro Hatakeyama, Tohru Satake, Nobuharu Noji | 2005-06-21 |
| 6815698 | Charged particle beam exposure system | Osamu Nagano, Susumu Hashimoto, Motosuke Miyoshi | 2004-11-09 |
| 6768112 | Substrate inspection system and method for controlling same | Motosuke Miyoshi | 2004-07-27 |
| 6690529 | Disk storage device and parameter transfer method | Kiyohide Toshikawa | 2004-02-10 |
| 6563308 | Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium | Osamu Nagano, Motosuke Miyoshi, Hisashi Kaneko, Tetsuo Matsuda | 2003-05-13 |
| 6534766 | Charged particle beam system and pattern slant observing method | Hideaki Abe, Kazuyoshi Sugihara, Masahiro Inoue | 2003-03-18 |