Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8956463 | Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus | — | 2015-02-17 |
| 7351504 | Photomask blank substrate, photomask blank and photomask | Masayuki Nakatsu, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo | 2008-04-01 |
| 7344808 | Method of making photomask blank substrates | Masayuki Nakatsu, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo | 2008-03-18 |
| 7329475 | Method of selecting photomask blank substrates | Masayuki Nakatsu, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo | 2008-02-12 |
| 7179567 | Phase shift mask blank, phase shift mask, and method of manufacture | Yukio Inazuki, Masayuki Nakatsu, Atsushi Tajika, Hideo Kaneko, Satoshi Okazaki | 2007-02-20 |
| 7070888 | Method of selecting photomask blank substrates | Masayuki Nakatsu, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo | 2006-07-04 |