Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8920666 | Etching method and photomask blank processing method | Shinichi Igarashi, Yukio Inazuki, Hideo Kaneko, Hiroki Yoshikawa | 2014-12-30 |
| 8309277 | Photomask making method | Shinichi Igarashi, Yukio Inazuki, Hideo Kaneko, Hiroki Yoshikawa | 2012-11-13 |
| 7771893 | Photomask blank, photomask and fabrication method thereof | Hiroki Yoshikawa, Hiroshi Kubota, Satoshi Okazaki, Tamotsu Maruyama, Takashi Haraguchi +3 more | 2010-08-10 |
| 7625677 | Half-tone stacked film, photomask-blank, photomask and fabrication method thereof | Hiroki Yoshikawa, Yukio Inazuki, Satoshi Okazaki, Motohiko Morita, Tadashi Saga | 2009-12-01 |
| 7625676 | Photomask blank, photomask and fabrication method thereof | Hiroki Yoshikawa, Yukio Inazuki, Satoshi Okazaki, Takashi Haraguchi, Masahide Iwakata +1 more | 2009-12-01 |
| 7618753 | Photomask blank, photomask and method for producing those | Hiroki Yoshikawa, Yukio Inazuki, Satoshi Okazaki, Takashi Haraguchi, Masahide Iwakata +3 more | 2009-11-17 |
| 7232631 | Mask for charged particle beam exposure, and method of forming the same | Kenichi Morimoto, Yuki Aritsuka | 2007-06-19 |
| 6869736 | Halftone phase shift photomask and blank for halftone phase shift photomask | Hiro-o Nakagawa, Toshiaki Motonaga, Satoshi Yusa, Shigeki Sumida, Toshifumi Yokoyama +3 more | 2005-03-22 |
| 6764792 | Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it | Junji Fujikawa, Takafumi Okamura, Hiroshi Mohri, Toshifumi Yokoyama, Haruo Kokubo | 2004-07-20 |
| 6740455 | Photomask | Kenji Noguchi, Toshiaki Motonaga, Hiro-o Nakagawa, Yasutaka Morikawa, Toshifumi Yokoyama +3 more | 2004-05-25 |
| 6599667 | Halftone phase shift photomask and blank for halftone phase shift photomask | Satoshi Yusa, Toshifumi Yokoyama, Shigeki Sumida, Toshiaki Motonaga, Hiro-o Nakagawa +3 more | 2003-07-29 |
| 6458496 | Blank for halftone phase shift photomask and halftone phase shift photomask | Toshiaki Motonaga, Toshifumi Yokoyama, Takafumi Okamura, Hiroshi Mohri, Junji Fujikawa +4 more | 2002-10-01 |
| 6059993 | Record display medium and use thereof | Atsushi Baba, Hidetoshi Ozawa | 2000-05-09 |
| 5851422 | Polymeric material for liquid crystal/polymer composite film, record display medium, and use thereof | Wataru Saito, Atsushi Baba, Tadafumi Shindo, Naoki Shimada, Hidetoshi Ozawa +4 more | 1998-12-22 |