Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7771893 | Photomask blank, photomask and fabrication method thereof | Hiroki Yoshikawa, Hiroshi Kubota, Yoshinori Kinase, Satoshi Okazaki, Takashi Haraguchi +3 more | 2010-08-10 |
| 7622227 | Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof | Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki | 2009-11-24 |
| 6733930 | Photomask blank, photomask and method of manufacture | Tsutomu Shinagawa, Hideo Kaneko, Mikio Kojima, Yukio Inazuki, Satoshi Okazaki | 2004-05-11 |
| 6727027 | Photomask blank and photomask | Tetsushi Tsukamoto, Hideo Kaneko, Yukio Inazuki, Tsutomu Shinagawa, Satoshi Okazaki | 2004-04-27 |
| 6641958 | Phase shift mask blank, phase shift mask, and methods of manufacture | Yukio Inazuki, Mikio Kojima, Hideo Kaneko, Masataka Watanabe, Satoshi Okazaki | 2003-11-04 |
| 6514642 | Phase shift mask and method of manufacture | Satoshi Okazaki, Yukio Inazuki, Hideo Kaneko, Shinichi Kohno | 2003-02-04 |
| 6511778 | Phase shift mask blank, phase shift mask and method of manufacture | Satoshi Okazaki, Ichiro Kaneko, Jiro Moriya, Masayuki Suzuki | 2003-01-28 |
| 6503669 | Photomask blank, photomask and method of manufacture | Hideo Kaneko, Yukio Inazuki, Satoshi Okazaki | 2003-01-07 |
| 6503668 | Phase shift mask blank, phase shift mask, and method of manufacture | Yukio Inazuki, Hideo Kaneko, Satoshi Okazaki | 2003-01-07 |
| 6352801 | Phase shift mask and making process | Satoshi Okazaki, Hideo Kaneko, Yukio Inazuki | 2002-03-05 |
| 5989985 | Semiconductor single crystalline substrate and method for production thereof | Shigeyuki Sato | 1999-11-23 |
| 5882401 | Method for manufacturing silicon single crystal substrate for use of epitaxial layer growth | Hiroki Ose | 1999-03-16 |
| 5751055 | Semiconductor single crystalline substrate and method for production thereof | Shigeyuki Sato | 1998-05-12 |