NU

Naoto Umezawa

NS National Institute For Materials Science: 2 patents #189 of 901Top 25%
Samsung: 2 patents #37,631 of 75,807Top 50%
📍 Ibaraki, JP: #2,214 of 6,779 inventorsTop 35%
Overall (All Time): #1,120,640 of 4,157,543Top 30%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
12181799 Resist compositions and semiconductor fabrication methods using the same Thanh Cuong Nguyen, Daekeon Kim, Tsunehiro Nishi, Hyunwoo KIM 2024-12-31
11329137 Semiconductor devices and methods of manufacturing the same Satoru Yamada, Junsoo Kim, Honglae Park, Chunhyung Chung 2022-05-10
8759925 Method for reducing thickness of interfacial layer, method for forming high dielectric constant gate insulating film, high dielectric constant gate insulating film, high dielectric constant gate oxide film, and transistor having high dielectric constant gate oxide film Toyohiro Chikyo, Toshihide Nabatame 2014-06-24
8575038 Method for reducing thickness of interfacial layer, method for forming high dielectric constant gate insulating film, high dielectric constant gate insulating film, high dielectric constant gate oxide film, and transistor having high dielectric constant gate oxide film Toyohiro Chikyo, Toshihide Nabatame 2013-11-05