HK

Haruhiko Komoriya

CL Central Glass Company, Limited: 57 patents #2 of 968Top 1%
SC Shin-Etsu Chemical Co.: 20 patents #231 of 2,176Top 15%
Sumitomo Electric Industries: 15 patents #1,596 of 21,551Top 8%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
Overall (All Time): #43,282 of 4,157,543Top 2%
57
Patents All Time

Issued Patents All Time

Showing 1–25 of 57 patents

Patent #TitleCo-InventorsDate
9966575 Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition Yoshiharu Terui, Fumito Kobayashi, Yukari Hara, Ikunari Hara 2018-05-08
9842993 Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same Yoshiharu Terui, Fumito Kobayashi, Yukari Hara, Ikunari Hara 2017-12-12
9678425 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2017-06-13
9678426 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2017-06-13
9650451 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Shinichi Sumida, Kazuhiko Maeda 2017-05-16
9512070 Method for producing compound containing BIS (perfluoroalkylsulfonyl) methyl group and salt thereof, and solid electrolyte membrane produced using same Arata Takahashi, Katsutoshi Suzuki, Toru Tanaka, Saori Itabashi 2016-12-06
9318764 Proton conducting polymer membrane, membrane-electrode assembly using same, and polymer electrolyte fuel cell Toru Tanaka, Katsutoshi Suzuki, Arata Takahashi, Saori Itabashi 2016-04-19
9310682 Positive-type resist composition Yoshiharu Terui, Takashi Mori 2016-04-12
9204652 Antibacterial agent, substrate surface treatment method using the same, antibacterial agent composition, and substrate surface treatment method using the same Katsutoshi Suzuki, Toru Tanaka, Takamasa Kitamoto, Masayuki Shiota, Ryoko Shimada +1 more 2015-12-08
9171655 Solid electrolyte film, and method for producing same Katsutoshi Suzuki, Yoshihiko Obara, Toru Tanaka 2015-10-27
8822588 Fluorine-containing polymer and anti-static agent wherein same is used Yoshiharu Terui, Susumu Inoue, Takashi Kume 2014-09-02
8716385 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2014-05-06
8691491 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Shinichi Sumida, Kazuhiko Maeda 2014-04-08
8663903 Top coating composition Kazuhiko Maeda, Takamasa Kitamoto, Satoru Narizuka, Yoshimi Isono, Kazunori Mori 2014-03-04
8592508 Top coat composition Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2013-11-26
8445551 Solid electrolyte membrane for fuel cell and process for producing same Yoshihiko Obara, Katsutoshi Suzuki, Toru Tanaka 2013-05-21
8211612 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern Kazuhiko Maeda, Mitsutaka Otani, Takeo Komata, Shinya Akiba 2012-07-03
8115036 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda 2012-02-14
7947422 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Shinichi Sumida, Kazuhiko Maeda 2011-05-24
7781602 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same Shinichi Sumida, Katsunori Kawamura, Satoru Kobayashi, Satoru Miyazawa, Kazuhiko Maeda 2010-08-24
7736835 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda 2010-06-15
7666967 Ester compound, polymer, resist composition, and patterning process Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more 2010-02-23
7569323 Resist protective coating material and patterning process Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Masaru Sasago +3 more 2009-08-04
7488567 Polymer, resist composition and patterning process Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more 2009-02-10
7417100 Transparent fluorine-containing copolymer Sunao Koga, Kentaro Tsutsumi, Kazuhiko Maeda 2008-08-26