Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7402626 | Top coat composition | Kazuhiko Maeda, Shinichi Sumida, Satoru Miyazawa, Michitaka Ootani | 2008-07-22 |
| 7399815 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers | Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Kazuhiko Maeda | 2008-07-15 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2008-05-27 |
| 7354693 | Polymer, resist protective coating material, and patterning process | Jun Hatakeyama, Yoshio Kawai, Kazuhiko Maeda, Michitaka Ootani | 2008-04-08 |
| 7276623 | Polymerizable ester compounds | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Kazuhiko Maeda, Michitaka Ootani | 2007-10-02 |
| 7241553 | Polymer, resist composition, and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2007-07-10 |
| 7232917 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | Shinichi Sumida, Kazuhiko Maeda | 2007-06-19 |
| 7169869 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2007-01-30 |
| 7125642 | Sulfonates, polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2006-10-24 |
| 7125641 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2006-10-24 |
| 7125643 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2006-10-24 |
| 7125943 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | Shinichi Sumida, Kazuhiko Maeda | 2006-10-24 |
| 7122292 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | Shinichi Sumida, Katsutoshi Suzuki, Kazuhiko Maeda | 2006-10-17 |
| 7109383 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers | Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Kazuhiko Maeda | 2006-09-19 |
| 7105618 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | Shinichi Sumida, Michitaka Otani, Kazuhiko Maeda | 2006-09-12 |
| 7067231 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2006-06-27 |
| 7060771 | Transparent fluorine-containing copolymer | Sunao Koga, Kentaro Tsutsumi, Kazuhiko Maeda | 2006-06-13 |
| 7001707 | Resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2006-02-21 |
| 6992210 | Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes | Satoru Kobayashi, Katsunori Kawamura, Kazuhiko Maeda | 2006-01-31 |
| 6946235 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-09-20 |
| 6943271 | Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same | Shinichi Sumida, Takashi Kume, Sunao Koga | 2005-09-13 |
| 6916592 | Esters, polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-07-12 |
| 6875556 | Resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-04-05 |
| 6872514 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-03-29 |
| 6858760 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | Satoru Miyazawa, Katsunori Kawamura, Satoru Kobayashi, Kazuhiko Maeda | 2005-02-22 |