SS

Shinichi Sumida

CL Central Glass Company, Limited: 16 patents #39 of 968Top 5%
Overall (All Time): #297,535 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
9678425 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2017-06-13
9678426 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2017-06-13
9650451 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Haruhiko Komoriya, Kazuhiko Maeda 2017-05-16
8716385 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2014-05-06
8691491 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Haruhiko Komoriya, Kazuhiko Maeda 2014-04-08
8592508 Top coat composition Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto 2013-11-26
8115036 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Haruhiko Komoriya, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda 2012-02-14
7947422 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Haruhiko Komoriya, Kazuhiko Maeda 2011-05-24
7781602 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same Haruhiko Komoriya, Katsunori Kawamura, Satoru Kobayashi, Satoru Miyazawa, Kazuhiko Maeda 2010-08-24
7736835 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern Haruhiko Komoriya, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda 2010-06-15
7402626 Top coat composition Kazuhiko Maeda, Haruhiko Komoriya, Satoru Miyazawa, Michitaka Ootani 2008-07-22
7232917 Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation Haruhiko Komoriya, Kazuhiko Maeda 2007-06-19
7125943 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions Haruhiko Komoriya, Kazuhiko Maeda 2006-10-24
7122292 Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same Haruhiko Komoriya, Katsutoshi Suzuki, Kazuhiko Maeda 2006-10-17
7105618 Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same Haruhiko Komoriya, Michitaka Otani, Kazuhiko Maeda 2006-09-12
6943271 Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same Takashi Kume, Sunao Koga, Haruhiko Komoriya 2005-09-13