Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11987772 | Solvent composition | Kanako OSAFUNE, Fuyuhiko Sakyu | 2024-05-21 |
| 8450520 | Process for preparation of 2-fluoroacrylic esters | Akihiro Ishii, Takako Yamazaki, Hideyuki Tsuruta, Satoru Miyazawa, Takashi Ootsuka +2 more | 2013-05-28 |
| 8115036 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | Haruhiko Komoriya, Shinichi Sumida, Takeo Komata, Kazuhiko Maeda | 2012-02-14 |
| 7736835 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | Haruhiko Komoriya, Shinichi Sumida, Takeo Komata, Kazuhiko Maeda | 2010-06-15 |
| 7666967 | Ester compound, polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2010-02-23 |
| 7569323 | Resist protective coating material and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Masaru Sasago +3 more | 2009-08-04 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2009-02-10 |
| 7402626 | Top coat composition | Kazuhiko Maeda, Haruhiko Komoriya, Shinichi Sumida, Satoru Miyazawa | 2008-07-22 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2008-05-27 |
| 7354693 | Polymer, resist protective coating material, and patterning process | Jun Hatakeyama, Yoshio Kawai, Kazuhiko Maeda, Haruhiko Komoriya | 2008-04-08 |
| 7276623 | Polymerizable ester compounds | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Kazuhiko Maeda, Haruhiko Komoriya | 2007-10-02 |
| 7169869 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2007-01-30 |
| 7005228 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +4 more | 2006-02-28 |
| 6946235 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-09-20 |
| 6933095 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +4 more | 2005-08-23 |
| 6916592 | Esters, polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-07-12 |
| 6872514 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-03-29 |
| 6864037 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +4 more | 2005-03-08 |
| 6861197 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago +5 more | 2005-03-01 |
| 6855477 | Chemically amplified resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2005-02-15 |
| 6824955 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +3 more | 2004-11-30 |
| 6790586 | Resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Jun Watanabe, Yoshio Kawai, Masaru Sasago +5 more | 2004-09-14 |
| 6723485 | Positive resist composition and process for forming resist pattern using same | Kentaro Tsutsumi, Kazuhiko Maeda | 2004-04-20 |
| 6710148 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago +5 more | 2004-03-23 |
| 6680389 | Ester compounds | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Satoru Miyazawa, Kentaro Tsutsumi +1 more | 2004-01-20 |