YI

Yoshimi Isono

CL Central Glass Company, Limited: 14 patents #48 of 968Top 5%
Overall (All Time): #352,074 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
9221928 Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method Misugi Kato, Satoru Narizuka, Ryozo Takihana, Kazunori Mori 2015-12-29
8846966 Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt Yuji Hagiwara, Ryozo Takihana, Masanori Fushimi, Satoru Narizuka 2014-09-30
8809451 Fluorinated dicarboxylic acid derivative and polymer obtained therefrom Satoru Narizuka, Hidehisa Nanai, Kazuhiro Yamanaka 2014-08-19
8686098 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method Kazunori Mori, Yuji Hagiwara, Masashi Nagamori, Satoru Narizuka, Kazuhiko Maeda 2014-04-01
8663903 Top coating composition Kazuhiko Maeda, Takamasa Kitamoto, Haruhiko Komoriya, Satoru Narizuka, Kazunori Mori 2014-03-04
8592622 Polymerizable fluorine-containing compound Jonathan Joachim Jodry, Satoru Narizuka 2013-11-26
8592540 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same Kazunori Mori, Yuji Hagiwara, Satoru Narizuka, Kazuhiko Maeda 2013-11-26
8513457 Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka 2013-08-20
8283106 Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent Kazuhiko Maeda, Satoru Narizuka 2012-10-09
8187787 Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka 2012-05-29
7906269 Positive-type resist composition Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka 2011-03-15
7887990 Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same Jonathan Joachim Jodry, Satoru Narizuka 2011-02-15
7557233 Method for synthesizing ionic complex Syoichi Tsujioka 2009-07-07
6849752 Process for synthesizing ionic metal complex Shoichi Tsujioka, Hironari Takase, Mikihiro Takahashi 2005-02-01