JJ

Jonathan Joachim Jodry

CL Central Glass Company, Limited: 12 patents #57 of 968Top 6%
JS Jsr: 1 patents #649 of 1,137Top 60%
📍 Kawagoe, JP: #133 of 1,278 inventorsTop 15%
Overall (All Time): #421,642 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
8748672 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same Yuji Hagiwara, Masashi Nagamori, Masaki Fujiwara, Satoru Narizuka 2014-06-10
8592622 Polymerizable fluorine-containing compound Yoshimi Isono, Satoru Narizuka 2013-11-26
8581009 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same Yuji Hagiwara, Masashi Nagamori, Masaki Fujiwara, Satoru Narizuka 2013-11-12
8513457 Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same Yoshimi Isono, Satoru Narizuka, Kazuhiro Yamanaka 2013-08-20
8435717 Compound for photoacid generator, resist composition using the same, and pattern-forming method Yuji Hagiwara, Satoru Narizuka, Kazuhiko Maeda 2013-05-07
8222448 Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt Masashi Nagamori, Yuji Hagiwara, Masaki Fujiwara, Satoru Narizuka 2012-07-17
8187787 Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same Yoshimi Isono, Satoru Narizuka, Kazuhiro Yamanaka 2012-05-29
8110711 Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt Masashi Nagamori, Yuji Hagiwara, Masaki Fujiwara, Satoru Narizuka 2012-02-07
7956142 Polymerizable sulfonic acid onium salt and resin Tomoki Nagai, Takuma Ebata, Makoto Shimizu, Satoru Narizuka, Masaki Fujiwara 2011-06-07
7906269 Positive-type resist composition Yoshimi Isono, Satoru Narizuka, Kazuhiro Yamanaka 2011-03-15
7887990 Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same Yoshimi Isono, Satoru Narizuka 2011-02-15
7414148 Process for producing alkoxycarbonylfluoroalkanesulfonates Masaki Fujiwara, Satoru Narizuka 2008-08-19