YK

Yoshio Kawai

SC Shin-Etsu Chemical Co.: 59 patents #51 of 2,176Top 3%
CL Central Glass Company, Limited: 29 patents #11 of 968Top 2%
Sumitomo Electric Industries: 23 patents #806 of 21,551Top 4%
FC Fujisawa Pharmaceutical Co.: 15 patents #53 of 782Top 7%
NT NTT: 12 patents #334 of 4,871Top 7%
IBM: 6 patents #16,453 of 70,183Top 25%
MC Mitsubishi Gas Chemical Company: 6 patents #328 of 1,727Top 20%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
SC Sumitomo Chemical: 1 patents #2,469 of 4,033Top 65%
JC Japan Hydrazine Co.: 1 patents #17 of 35Top 50%
📍 Joetsu, JP: #16 of 239 inventorsTop 7%
Overall (All Time): #19,669 of 4,157,543Top 1%
86
Patents All Time

Issued Patents All Time

Showing 26–50 of 86 patents

Patent #TitleCo-InventorsDate
7189493 Polymer, positive resist composition, and patterning process using the same Jun Hatakeyama, Yuji Harada 2007-03-13
7169869 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2007-01-30
7125641 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2006-10-24
7125643 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2006-10-24
7125642 Sulfonates, polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2006-10-24
7067231 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2006-06-27
7005228 Polymers, resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura +4 more 2006-02-28
7001707 Resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2006-02-21
6946235 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2005-09-20
6933095 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +4 more 2005-08-23
6916592 Esters, polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2005-07-12
6875556 Resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2005-04-05
6872514 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2005-03-29
6866983 Resist compositions and patterning process Jun Hatakeyama, Yuji Harada 2005-03-15
6864037 Polymers, resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura +4 more 2005-03-08
6861197 Polymers, resist compositions and patterning process Yuji Harada, Jun Watanabe, Jun Hatakeyama, Masaru Sasago, Masayuki Endo +5 more 2005-03-01
6855477 Chemically amplified resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2005-02-15
6841334 Onium salts and positive resist materials using the same Fujio Yagihashi, Tomoyoshi Furihata, Jun Watanabe, Akinobu Tanaka, Tadahito Matsuda 2005-01-11
6824955 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more 2004-11-30
6790586 Resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Jun Watanabe, Masaru Sasago, Masayuki Endo +5 more 2004-09-14
6790591 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama 2004-09-14
6710148 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Jun Watanabe, Masaru Sasago, Masayuki Endo +5 more 2004-03-23
6680389 Ester compounds Yuji Harada, Jun Hatakeyama, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi +1 more 2004-01-20
6667415 Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same Fujio Yagihashi, Jun Watanabe, Minoru Takamizawa, Akinobu Tanaka, Tadahito Matsuda 2003-12-23
6623909 Polymers, resist compositions and patterning process Jun Hatakeyama, Toshiaki Takahashi, Toshinobu Ishihara, Jun Watanabe, Tohru Kubota 2003-09-23