Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6841334 | Onium salts and positive resist materials using the same | Fujio Yagihashi, Tomoyoshi Furihata, Jun Watanabe, Akinobu Tanaka, Yoshio Kawai | 2005-01-11 |
| 6667415 | Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | Fujio Yagihashi, Jun Watanabe, Minoru Takamizawa, Akinobu Tanaka, Yoshio Kawai | 2003-12-23 |
| 5636004 | Projection exposure method and apparatus | Akihiro Ootaka, Yoshio Kawai | 1997-06-03 |
| 5624787 | Chemically amplified positive resist composition | Satoshi Watanabe, Katsuyuki Oikawa, Toshinobu Ishihara, Akinobu Tanaka, Yoshio Kawai | 1997-04-29 |
| 5414746 | X-ray exposure mask and fabrication method thereof | Kimiyoshi Deguchi, Yoh Somemura, Kazunori Miyoshi | 1995-05-09 |
| 4808829 | Mark position detection system for use in charged particle beam apparatus | Masahide Okumura, Takashi Matsuzaka, Genya Matsuoka, Kazumi Iwadate, Ryoichi Yamaguchi | 1989-02-28 |
| 4634645 | Method of forming resist micropattern | Katsuhiro Harada, Shigeru Moriya, Tetsuyoshi Ishii | 1987-01-06 |
| 4489241 | Exposure method with electron beam exposure apparatus | Tsuneo Okubo, Susumu Ozasa, Norio Saitou, Haruo Yoda | 1984-12-18 |
| 4437008 | Electron beam control system | Masahide Okumura, Hisatake Yokouchi, Susumu Ozasa, Yasuo Kato | 1984-03-13 |