Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11450186 | Person monitoring system and person monitoring method | Takashi Kamio, Eisaku Miyata, Koji Yano | 2022-09-20 |
| 10791395 | Flying object detection system and flying object detection method | Takashi Kamio, Eisuke Hiraoka | 2020-09-29 |
| 10592731 | Facial recognition system, facial recognition server, and facial recognition method | Masashige TSUNENO, Kaoru Tsurumi | 2020-03-17 |
| 10182280 | Sound processing apparatus, sound processing system and sound processing method | Michinori Kishimoto, Yoshiyuki Watanabe, Makoto Takakuwa, Manabu Nakamura, Hideki Shuto +3 more | 2019-01-15 |
| 8827966 | Skin patch instrument for treating pain | — | 2014-09-09 |
| 7094867 | Method of continuously cleansing polyarylene sulfide | Michihisa Miyahara, Mitsuhiro Matsuzaki | 2006-08-22 |
| 6946665 | Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus | Masato Muraki, Yoshinori Nakayama, Hiroya Ohta, Haruo Yoda | 2005-09-20 |
| 6768118 | Electron beam monitoring sensor and electron beam monitoring method | Yoshinori Nakayama, Yasunari Sohda, Hiroya Ohta, Masato Muraki, Masaki Takakuwa | 2004-07-27 |
| 6730916 | Electron beam lithography apparatus | Hiroshi Tsuji, Mitsuru Inoue, Yasuhiro Someda, Yoshimasa Fukushima | 2004-05-04 |
| 6667486 | Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same | Hiroya Ohta, Yasunari Sohda, Haruo Yoda, Yoshikiyo Yui, Shin'ichi Hashimoto | 2003-12-23 |
| 6511048 | Electron beam lithography apparatus and pattern forming method | Yasunari Sohda, Yasuhiro Someda, Hiroya Ohta, Takashi Matsuzaka, Yoshinori Nakayama | 2003-01-28 |
| 6159644 | Method of fabricating semiconductor circuit devices utilizing multiple exposures | Hidetoshi Satoh, Yoshinori Nakayama, Masahide Okumura, Hiroya Ohta | 2000-12-12 |
| 5759423 | Electron beam writing method and apparatus for carrying out the same | Yasunari Sohda, Yasuhiro Someda, Hiroyuki Itoh, Katsuhiro Kawasaki | 1998-06-02 |
| 5757409 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa +2 more | 1998-05-26 |
| 5650631 | Electron beam writing system | Yasunari Sohda, Masahide Okumura, Yasuhiro Someda, Hidetoshi Satoh, Yoshinori Nakayama | 1997-07-22 |
| 5557314 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa +2 more | 1996-09-17 |
| 5420436 | Methods for measuring optical system, and method and apparatus for exposure using said measuring method | Eiichi Seya, Massaaki Ito, Soichi Katagiri, Tsuneo Terasawa, Minoru Hidaka +1 more | 1995-05-30 |
| 5311026 | Charged particle beam lithography system and method therefor | Yoshihiko Okamoto, Takashi Yamazaki, Hideo Todokoro | 1994-05-10 |
| 5283440 | Electron beam writing system used in a cell projection method | Yasunari Sohda, Hideo Todokoro, Haruo Yoda, Hiroyuki Itoh, Hiroyuki Shinada +2 more | 1994-02-01 |
| 5162240 | Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate | Hideo Todokoro, Katsuhiro Kuroda, Satoru Fukuhara, Genya Matsuoka, Hideo Arima +3 more | 1992-11-10 |
| 4943729 | Electron beam lithography system | Kimiaki Ando, Mitsuo Ooyama | 1990-07-24 |
| 4829444 | Charged particle beam lithography system | Masahide Okumura, Tsutomu Komoda, Mitsuo Ooyama | 1989-05-09 |
| 4820928 | Lithography apparatus | Mitsuo Ooyama, Kimiaki Ando, Yoshio Kawamura, Takanori Simura, Hiroyuki Kohida | 1989-04-11 |
| 4740698 | Hybrid charged particle apparatus | Hifumi Tamura, Kaoru Umemura | 1988-04-26 |
| 4701620 | Electron beam exposure apparatus | Masahide Okumura, Takashi Matsuzaka, Genya Matsuoka | 1987-10-20 |