Issued Patents All Time
Showing 26–31 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4692579 | Electron beam lithography apparatus | Susumu Ozasa, Masahide Okumura, Mitsuo Ooyama, Tsutomu Komoda, Katsuhiro Harada +2 more | 1987-09-08 |
| 4577111 | Apparatus for electron beam lithography | Susumu Ozasa, Takashi Matsuzaka | 1986-03-18 |
| 4489241 | Exposure method with electron beam exposure apparatus | Tadahito Matsuda, Tsuneo Okubo, Susumu Ozasa, Haruo Yoda | 1984-12-18 |
| 4445040 | Shaping aperture for a charged particle forming system | Teruo Iwasaki, Akira Yanagisawa | 1984-04-24 |
| 4443703 | Method and apparatus of deflection calibration for a charged particle beam exposure apparatus | Nobuo Shimazu, Tsuneo Okubo, Susumu Ozasa | 1984-04-17 |
| 4396901 | Method for correcting deflection distortion in an apparatus for charged particle lithography | Susumu Ozasa, Katsuhiro Kuroda | 1983-08-02 |