Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5523567 | Scanning electron microscope and image forming method therewith | Shigeru Kawamata | 1996-06-04 |
| 4933553 | Focusing apparatus of electron microscope | Junichiro Tomizawa | 1990-06-12 |
| 4801847 | Charged particle accelerator using quadrupole electrodes | Noriyuki Sakudo, Katsumi Tokiguchi, Hidemi Koike, Osami Okada, Norio Saito | 1989-01-31 |
| 4692579 | Electron beam lithography apparatus | Norio Saitou, Masahide Okumura, Mitsuo Ooyama, Tsutomu Komoda, Katsuhiro Harada +2 more | 1987-09-08 |
| 4658143 | Ion source | Katsumi Tokiguchi, Hidemi Koike, Noriyuki Sakudo, Osami Okada, Ken Ninomiya | 1987-04-14 |
| 4642461 | Field emission type electron microscope using a multi-stage acceleration tube | Junji Endo, Akira Tonomura, Tsuyoshi Matsuda, Chikara Kimura, Nobuyuki Osakabe | 1987-02-10 |
| 4629930 | Plasma ion source | Noriyuki Sakudo, Osami Okada, Katsumi Tokiguchi, Hidemi Koike, Shunroku Taya +2 more | 1986-12-16 |
| 4589773 | Position detecting system | Satoshi Ido, Minpei Fujinami, Yasuo Kato, Yoshio Sakitani | 1986-05-20 |
| 4577111 | Apparatus for electron beam lithography | Norio Saitou, Takashi Matsuzaka | 1986-03-18 |
| 4489241 | Exposure method with electron beam exposure apparatus | Tadahito Matsuda, Tsuneo Okubo, Norio Saitou, Haruo Yoda | 1984-12-18 |
| 4443703 | Method and apparatus of deflection calibration for a charged particle beam exposure apparatus | Nobuo Shimazu, Tsuneo Okubo, Norio Saitou | 1984-04-17 |
| 4437008 | Electron beam control system | Tadahito Matsuda, Masahide Okumura, Hisatake Yokouchi, Yasuo Kato | 1984-03-13 |
| 4400622 | Electron lens equipment | Yoshinobu Takeuchi, Katsuhiro Kuroda | 1983-08-23 |
| 4396901 | Method for correcting deflection distortion in an apparatus for charged particle lithography | Norio Saitou, Katsuhiro Kuroda | 1983-08-02 |
| 4199688 | Apparatus for electron beam lithography | — | 1980-04-22 |