| 5523567 |
Scanning electron microscope and image forming method therewith |
Shigeru Kawamata |
1996-06-04 |
| 4933553 |
Focusing apparatus of electron microscope |
Junichiro Tomizawa |
1990-06-12 |
| 4801847 |
Charged particle accelerator using quadrupole electrodes |
Noriyuki Sakudo, Katsumi Tokiguchi, Hidemi Koike, Osami Okada, Norio Saito |
1989-01-31 |
| 4692579 |
Electron beam lithography apparatus |
Norio Saitou, Masahide Okumura, Mitsuo Ooyama, Tsutomu Komoda, Katsuhiro Harada +2 more |
1987-09-08 |
| 4658143 |
Ion source |
Katsumi Tokiguchi, Hidemi Koike, Noriyuki Sakudo, Osami Okada, Ken Ninomiya |
1987-04-14 |
| 4642461 |
Field emission type electron microscope using a multi-stage acceleration tube |
Junji Endo, Akira Tonomura, Tsuyoshi Matsuda, Chikara Kimura, Nobuyuki Osakabe |
1987-02-10 |
| 4629930 |
Plasma ion source |
Noriyuki Sakudo, Osami Okada, Katsumi Tokiguchi, Hidemi Koike, Shunroku Taya +2 more |
1986-12-16 |
| 4589773 |
Position detecting system |
Satoshi Ido, Minpei Fujinami, Yasuo Kato, Yoshio Sakitani |
1986-05-20 |
| 4577111 |
Apparatus for electron beam lithography |
Norio Saitou, Takashi Matsuzaka |
1986-03-18 |
| 4489241 |
Exposure method with electron beam exposure apparatus |
Tadahito Matsuda, Tsuneo Okubo, Norio Saitou, Haruo Yoda |
1984-12-18 |
| 4443703 |
Method and apparatus of deflection calibration for a charged particle beam exposure apparatus |
Nobuo Shimazu, Tsuneo Okubo, Norio Saitou |
1984-04-17 |
| 4437008 |
Electron beam control system |
Tadahito Matsuda, Masahide Okumura, Hisatake Yokouchi, Yasuo Kato |
1984-03-13 |
| 4400622 |
Electron lens equipment |
Yoshinobu Takeuchi, Katsuhiro Kuroda |
1983-08-23 |
| 4396901 |
Method for correcting deflection distortion in an apparatus for charged particle lithography |
Norio Saitou, Katsuhiro Kuroda |
1983-08-02 |
| 4199688 |
Apparatus for electron beam lithography |
— |
1980-04-22 |