Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5396077 | Electron beam lithography apparatus having electron optics correction system | Yasunari Sohda, Hiroyuki Itoh, Yasuhiro Someda, Yoshinori Nakayama, Hidetoshi Satoh | 1995-03-07 |
| 5285075 | Electron beam lithography method | Yoshinori Minamide, Hiroyoshi Ando | 1994-02-08 |
| 5209813 | Lithographic apparatus and method | Yoshitada Oshida, Teruo Iwasaki, Toshio Kaneko, Hiroyuki Takahashi, Hiroyoshi Ando +2 more | 1993-05-11 |
| 5166529 | Electron beam lithography system | Hiroyoshi Ando, Hiroyuki Takahashi, Hidenori Yamaguchi, Teruo Iwasaki | 1992-11-24 |
| 5162240 | Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate | Norio Saitou, Hideo Todokoro, Katsuhiro Kuroda, Satoru Fukuhara, Hideo Arima +3 more | 1992-11-10 |
| 4808829 | Mark position detection system for use in charged particle beam apparatus | Masahide Okumura, Takashi Matsuzaka, Kazumi Iwadate, Tadahito Matsuda, Ryoichi Yamaguchi | 1989-02-28 |
| 4701620 | Electron beam exposure apparatus | Masahide Okumura, Takashi Matsuzaka, Norio Saitou | 1987-10-20 |
| 4336597 | Method and system for measuring the diameter of an electron beam | Tsuneo Okubo, Yasuo Kato | 1982-06-22 |