Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4820609 | Highly sensitive positive resist mixture | Katsuhiro Harada | 1989-04-11 |
| 4808829 | Mark position detection system for use in charged particle beam apparatus | Masahide Okumura, Takashi Matsuzaka, Genya Matsuoka, Tadahito Matsuda, Ryoichi Yamaguchi | 1989-02-28 |
| 4699870 | Patterning method | Katsuhiro Harada | 1987-10-13 |
| 4692579 | Electron beam lithography apparatus | Norio Saitou, Susumu Ozasa, Masahide Okumura, Mitsuo Ooyama, Tsutomu Komoda +2 more | 1987-09-08 |