Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5757409 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Akira Hirakawa, Norio Saitou +2 more | 1998-05-26 |
| 5557314 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Akira Hirakawa, Norio Saitou +2 more | 1996-09-17 |
| 5424550 | Charged particle beam exposure apparatus | Masamichi Kawano, Masahide Okumura, Haruo Yoda, Tadao Konishi | 1995-06-13 |
| 5371373 | Electron beam lithography method and apparatus separating repetitive and non-repetitive pattern data | Akira Hirakawa | 1994-12-06 |
| 5281827 | Charged particle beam exposure apparatus | Masamichi Kawano, Masahide Okumura, Haruo Yoda, Tadao Konishi | 1994-01-25 |
| 5250812 | Electron beam lithography using an aperture having an array of repeated unit patterns | Fumio Murai, Shinji Okazaki, Haruo Yoda, Akira Tsukizoe | 1993-10-05 |
| 5206517 | Electron beam lithographic method | Ikuo Takada, Akira Hirakawa, Tadao Konishi | 1993-04-27 |