Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10620537 | Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition | Takeru Watanabe, Daisuke KORI, Yusuke Biyajima, Tsutomu Ogihara | 2020-04-14 |
| 10429739 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Yoshinori Taneda | 2019-10-01 |
| 9984891 | Method for forming organic film and method for manufacturing substrate for semiconductor apparatus | Tsutomu Ogihara | 2018-05-29 |
| 9902875 | Composition for forming a coating type BPSG film, substrate, and patterning process | Seiichiro Tachibana, Yoshinori Taneda, Tsutomu Ogihara | 2018-02-27 |
| 9880470 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | Seiichiro Tachibana, Yoshinori Taneda, Tsutomu Ogihara | 2018-01-30 |
| 9805943 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | Takeru Watanabe, Seiichiro Tachibana, Tsutomu Ogihara | 2017-10-31 |
| 9728420 | Organic film composition, process for forming organic film, patterning process, and compound | Daisuke KORI, Kazumi Noda, Kazunori Maeda, Tsutomu Ogihara | 2017-08-08 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Yoshinori Taneda, Tsutomu Ogihara, Yoshio Kawai, Karen E. Petrillo +1 more | 2017-02-28 |
| 9312127 | Method for producing semiconductor apparatus substrate | Tsutomu Ogihara, Daisuke KORI, Yoshinori Taneda, Yusuke Biyajima, Seiichiro Tachibana | 2016-04-12 |
| 5863601 | Process of producing graphite fiber | Masako Yudasaka, Yoshimasa Ohki | 1999-01-26 |