Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8088873 | Topcoat composition | Hiroshi Ito | 2012-01-03 |
| 8053537 | Method for using a topcoat composition | Hiroshi Ito | 2011-11-08 |
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Phillip Brock, Carl E. Larson, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-10-11 |
| 8003309 | Photoresist compositions and methods of use in high index immersion lithography | Hiroshi Ito, Daniel P. Sanders | 2011-08-23 |
| 7993812 | Calixarene blended molecular glass photoresists and processes of use | Luisa D. Bozano, Hiroshi Ito | 2011-08-09 |
| 7989026 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran | 2011-08-02 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more | 2011-05-31 |
| 7931829 | Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures | Geraud Jean-Michel Dubois, James L. Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang +3 more | 2011-04-26 |
| 7910290 | Photoresist topcoat for a photolithographic process | Robert David Allen, Ratnam Sooriyakumaran | 2011-03-22 |
| 7901868 | Photoresist topcoat for a photolithographic process | Robert David Allen, Rutnam Sooriyakumaran | 2011-03-08 |
| 7855045 | Immersion topcoat materials with improved performance | Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more | 2010-12-21 |
| 7820242 | Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures | Geraud Jean-Michel Dubois, James L. Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang +3 more | 2010-10-26 |
| 7763319 | Method of controlling orientation of domains in block copolymer films | Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders | 2010-07-27 |
| 7728089 | Topcoat compositions and methods of use thereof | Hiroshi Ito | 2010-06-01 |
| 7678537 | Graded topcoat materials for immersion lithography | Robert David Allen, Phillip Brock, Daniel P. Sanders | 2010-03-16 |
| 7521172 | Topcoat material and use thereof in immersion lithography processes | Robert Allen David, Phillip Brock, Sean D. Burns, Dario L. Goldfarb, David R. Medeiros +3 more | 2009-04-21 |
| 7521090 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran | 2009-04-21 |
| 7473749 | Preparation of topcoat compositions and methods of use thereof | Hiroshi Ito | 2009-01-06 |
| 7459183 | Method of forming low-K interlevel dielectric layers and structures | Geraud Jean-Michel Dubois, James L. Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang +3 more | 2008-12-02 |
| 7399581 | Photoresist topcoat for a photolithographic process | Robert David Allen, Ratnam Sooriyakumaran | 2008-07-15 |
| 7358035 | Topcoat compositions and methods of use thereof | Hiroshi Ito | 2008-04-15 |
| 7288362 | Immersion topcoat materials with improved performance | Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more | 2007-10-30 |