Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7393624 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2008-07-01 |
| 7358029 | Low activation energy dissolution modification agents for photoresist applications | Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong | 2008-04-15 |
| 7309754 | Stable encapsulant fluid capable of undergoing reversible Diels-Alder polymerization | Michael W. Chaw, Dan Dawson, Craig J. Hawker, James L. Hedrick, Teddie Peregrino Magbitang +4 more | 2007-12-18 |
| 7300739 | Negative resists based on a acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2007-11-27 |
| 7288362 | Immersion topcoat materials with improved performance | Robert David Allen, Dario Gil, William D. Hinsberg, Carl E. Larson, Linda Karin Sundberg +1 more | 2007-10-30 |
| 7209324 | Sliders bonded by a debondable encapsulant containing styrene and butadiene polymers | Michael W. Chaw, Dan Dawson, Craig J. Hawker, James L. Hedrick, Teddie Peregrino Magbitang +4 more | 2007-04-24 |
| 7193023 | Low activation energy photoresists | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong +1 more | 2007-03-20 |
| 7135595 | Photoresist composition | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more | 2006-11-14 |
| 7125467 | Slider processing system utilizing polyvinyl alcohol release layer | Michael W. Chaw, Dan Dawson, Craig J. Hawker, James L. Hedrick, Wesley L. Hillman +7 more | 2006-10-24 |
| 7064929 | Sliders bonded by a debondable encapsulant containing styrene and acrylate polymers | Dennis McKean, Robert D. Miller, Teddie Peregrino Magbitang, James L. Hedrick, Craig J. Hawker +4 more | 2006-06-20 |
| 7014980 | Photoresist composition | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more | 2006-03-21 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2005-08-09 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2004-11-16 |
| 6806026 | Photoresist composition | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more | 2004-10-19 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Ranee W. Kwong, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen +2 more | 2004-08-03 |
| 6730452 | Lithographic photoresist composition and process for its use | Daniel J. Dawson, Hiroshi Ito, Gregory Michael Wallraff | 2004-05-04 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Wu-Song Huang, Arpan Mahorowala +2 more | 2004-05-04 |
| 6677419 | Preparation of copolymers | Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Thomas I. Wallow, Masafumi Yamamoto | 2004-01-13 |
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff | 2003-11-25 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | Robert David Allen, Hiroshi Ito, Gregory Michael Wallraff | 2003-08-26 |
| 6548219 | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions | Hiroshi Ito, Gregory Michael Wallraff | 2003-04-15 |
| 6509134 | Norbornene fluoroacrylate copolymers and process for the use thereof | Hiroshi Ito, Dolores Carlotta Miller, Gregory Michael Wallraff | 2003-01-21 |
| 6444408 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff | 2002-09-03 |
| 6251560 | Photoresist compositions with cyclic olefin polymers having lactone moiety | Thomas I. Wallow, Robert David Allen, Richard Anthony DiPietro, Hiroshi Ito, Hoa D. Truong +1 more | 2001-06-26 |
| 6074800 | Photo acid generator compounds, photo resists, and method for improving bias | Gregory Breyta, Daniel J. Dawson, Ronald A. DellaGuardia, Charlotte R. DeWan, Andrew Robert Eckert +6 more | 2000-06-13 |