Issued Patents All Time
Showing 51–75 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7816068 | Underlayer compositions containing heterocyclic aromatic structures | Karen Temple, Pushkara R. Varanasi | 2010-10-19 |
| 7807332 | Underlayer compositions containing heterocyclic aromatic structures | Karen Temple, Pushkara R. Varanasi | 2010-10-05 |
| 7803521 | Photoresist compositions and process for multiple exposures with multiple layer photoresist systems | Kuang-Jung Chen, Wai-Kin Li, Pushkara R. Varanasi | 2010-09-28 |
| 7754820 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application | Wenjie Li, Pushkara R. Varanasi | 2010-07-13 |
| 7709370 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Phillip Brock, Blake Davis, Qinghuang Lin, Alshakim Nelson +2 more | 2010-05-04 |
| 7709187 | High resolution imaging process using an in-situ image modifying layer | Kaushal S. Patel, Margaret C. Lawson, Jaione Tirapu Azpiroz | 2010-05-04 |
| 7659050 | High resolution silicon-containing resist | James J. Bucchignano, David P. Klaus, Lidija Sekaric, Raman Viswanathan | 2010-02-09 |
| 7638266 | Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer | Marie Angelopoulos, Gregory Breyta, Robert N. Lang, Wenjie Li, David R. Medeiros +2 more | 2009-12-29 |
| 7608390 | Top antireflective coating composition containing hydrophobic and acidic groups | Mahmoud Khojasteh, Margaret C. Lawson, Kaushal S. Patel, Irene Popova, Pushkara R. Varanasi | 2009-10-27 |
| 7566527 | Fused aromatic structures and methods for photolithographic applications | James J. Bucchignano, Pushkara R. Varanasi, Roy R. Yu | 2009-07-28 |
| 7560222 | Si-containing polymers for nano-pattern device fabrication | Kuang-Jung Chen, Wai-Kin Li, Yi-Hsiung Lin | 2009-07-14 |
| 7544750 | Top antireflective coating composition with low refractive index at 193nm radiation wavelength | William H. Heath, Kaushal S. Patel, Pushkara R. Varanasi | 2009-06-09 |
| 7501353 | Method of formation of a damascene structure utilizing a protective film | Wai-Kin Li | 2009-03-10 |
| 7439302 | Low refractive index polymers as underlayers for silicon-containing photoresists | Sean D. Burns, Mahmoud Khojasteh | 2008-10-21 |
| 7435537 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application | Wenjie Li, Pushkara R. Varanasi | 2008-10-14 |
| 7407736 | Methods of improving single layer resist patterning scheme | Kuang-Jung Chen, Chung-Hsi Wu | 2008-08-05 |
| 7399573 | Method for using negative tone silicon-containing resist for e-beam lithography | Lidija Sekaric, James J. Bucchignano, David P. Klaus, Raman Viswanathan | 2008-07-15 |
| 7375172 | Underlayer compositions containing heterocyclic aromatic structures | Karen Temple, Pushkara R. Varanasi | 2008-05-20 |
| 7326523 | Low refractive index polymers as underlayers for silicon-containing photoresists | Sean D. Burns, Mahmoud Khojasteh | 2008-02-05 |
| 7320855 | Silicon containing TARC/barrier layer | Sean D. Burns, Pushkara R. Varanasi | 2008-01-22 |
| 7314700 | High sensitivity resist compositions for electron-based lithography | Wenjie Li, Wayne M. Moreau, David R. Medeiros, Karen E. Petrillo, Robert N. Lang +1 more | 2008-01-01 |
| 7300741 | Advanced chemically amplified resist for sub 30 nm dense feature resolution | David R. Medeiros, Gregory Michael Wallraff | 2007-11-27 |
| 7276327 | Silicon-containing compositions for spin-on arc/hardmask materials | Marie Angelopoulos, Arpan P. Mahorowila, Wayne M. Moreau, Dirk Pfeiffer, Ratnam Sooriyekumaren | 2007-10-02 |
| 7270931 | Silicon-containing compositions for spin-on ARC/hardmask materials | Marie Angelopoulos, Arpan P. Mahorowila, Wayne M. Moreau, Dirk Pfeiffer, Ratnam Sooriyakumaran | 2007-09-18 |
| 7168224 | Method of making a packaged radiation sensitive resist film-coated workpiece | Marie Angelopoulos, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2007-01-30 |