Issued Patents All Time
Showing 26–50 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8557501 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | Libor Vyklicky, Pushkara R. Varanasi | 2013-10-15 |
| 8546069 | Method for enhancing lithographic imaging of isolated and semi-isolated features | Gregory R. McIntyre | 2013-10-01 |
| 8546062 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | Irene Popova, Pushkara R. Varanasi, Libor Vyklicky | 2013-10-01 |
| 8492079 | Method of forming a pattern of an array of shapes including a blocked region | Chia-Chen Chen, Wai-Kin Li, Chandrasekhar Sarma | 2013-07-23 |
| 8395228 | Integration process to improve focus leveling within a lot process variation | Wai-Kin Li, Dario L. Goldfarb, Martin Glodde, Edward R. Engbrecht, Yiheng Xu | 2013-03-12 |
| 8394573 | Photoresist compositions and methods for shrinking a photoresist critical dimension | Kuang-Jung Chen, Wai-Kin Li, Sen Liu | 2013-03-12 |
| 8304178 | Top antireflective coating composition containing hydrophobic and acidic groups | Mahmoud Khojasteh, Margaret C. Lawson, Kaushal S. Patel, Irene Popova, Pushkara R. Varanasi | 2012-11-06 |
| 8293451 | Near-infrared absorbing film compositions | Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi +1 more | 2012-10-23 |
| 8268542 | Method for reducing side lobe printing using a barrier layer | Kuang-Jung Chen, Wai-Kin Li | 2012-09-18 |
| 8236476 | Multiple exposure photolithography methods and photoresist compositions | Kuang-Jung Chen, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2012-08-07 |
| 8227307 | Method for removing threshold voltage adjusting layer with external acid diffusion process | Kuang-Jung Chen, Ricardo A. Donaton, Wai-Kin Li | 2012-07-24 |
| 8227180 | Photolithography focus improvement by reduction of autofocus radiation transmission into substrate | Timothy A. Brunner, Sean D. Burns, Kuang-Jung Chen, Kafai Lai, Wai-Kin Li +1 more | 2012-07-24 |
| 8182978 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | Libor Vyklicky, Pushkara R. Varanasi | 2012-05-22 |
| 8158014 | Multi-exposure lithography employing differentially sensitive photoresist layers | Wai-Kin Li, Ping-Chuan Wang | 2012-04-17 |
| 8137893 | Chemical trim of photoresist lines by means of a tuned overcoat | Sean D. Burns, Matthew E. Colburn, Steven J. Holmes | 2012-03-20 |
| 8097401 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | Irene Popova, Pushkara R. Varanasi, Libor Vyklicky | 2012-01-17 |
| 8053172 | Photoresists and methods for optical proximity correction | Scott D. Halle, Ranee W. Kwong, Pushkara R. Varanasi | 2011-11-08 |
| 8029975 | Fused aromatic structures and methods for photolithographic applications | James J. Bucchignano, Pushkara R. Varanasi, Roy R. Yu | 2011-10-04 |
| 8021828 | Photoresist compositions and methods related to near field masks | Ranee W. Kwong, Pushkara R. Varanasi | 2011-09-20 |
| 7960095 | Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates | Wayne M. Moreau, Marie Angelopoulos, David R. Medeiros, Karen E. Petrillo | 2011-06-14 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Phillip Brock, Blake Davis, Qinghuang Lin, Alshakim Nelson +2 more | 2011-05-17 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Marie Angelopoulos, Timothy A. Brunner, Dirk Pfeiffer, Ratnam Sooriyakumaran | 2011-03-08 |
| 7862982 | Chemical trim of photoresist lines by means of a tuned overcoat material | Sean D. Burns, Matthew E. Colburn, Steven J. Holmes | 2011-01-04 |
| 7838198 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Kuang-Jung Chen, Wai-Kin Li, Pushkara R. Varanasi | 2010-11-23 |
| 7838200 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Kuang-Jung Chen, Wai-Kin Li, Pushkara R. Varanasi, Sen Liu | 2010-11-23 |