Issued Patents All Time
Showing 76–100 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7141692 | Molecular photoresists containing nonpolymeric silsesquioxanes | Robert David Allen, Mahmoud Khojasteh, Qinghuang Lin, Dirk Pfeiffer, Ratnam Sooriyakumaran +1 more | 2006-11-28 |
| 7090963 | Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging | David R. Medeiros, Gregory Michael Wallraff, Bill Hinsberg, Frances Anne Houle | 2006-08-15 |
| 6939664 | Low-activation energy silicon-containing resist system | Robert David Allen, Marie Angelopoulos, Ranee W. Kwong, Ratnam Sooriyakumaran | 2005-09-06 |
| 6821718 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2004-11-23 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Arpan Mahorowala +2 more | 2004-05-04 |
| 6689540 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, David R. Medeiros | 2004-02-10 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2003-11-25 |
| 6641971 | Resist compositions comprising silyl ketals and methods of use thereof | David R. Medeiros | 2003-11-04 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan Mahorowala +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Marie Angelopoulos, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2003-04-08 |
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, Wayne M. Moreau | 2003-01-07 |
| 6420088 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, Wayne M. Moreau | 2002-07-16 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, Robert N. Lang +3 more | 2002-07-16 |
| 6346362 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, David R. Medeiros | 2002-02-12 |
| 6338934 | Hybrid resist based on photo acid/photo base blending | Kuang-Jung Chen, Mark C. Hakey, Steven J. Holmes, Paul A. Rabidoux | 2002-01-15 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Kuang-Jung Chen, Ronald A. DellaGuardia, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2001-10-16 |
| 6300035 | Chemically amplified positive photoresists | James W. Thackeray, Peter R. Hagerty, James F. Cameron, Ahmad D. Katnani, Willard E. Conley | 2001-10-09 |
| 6268436 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Ahmad D. Katnani, Mahmoud Khojasteh, Quighuang Lin | 2001-07-31 |
| 6245492 | Photoresist system and process for aerial image enhancement | Ahmad D. Katnani, Ranee W. Kwong, Kathleen H. Martinek | 2001-06-12 |
| 6203965 | Photoresist comprising blends of photoacid generators | James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray, Ronald A. DellaGuardia +3 more | 2001-03-20 |
| 6200726 | Optimization of space width for hybrid photoresist | Kuang-Jung Chen, Steven J. Holmes, Ahmad D. Katnani, Paul A. Rabidoux | 2001-03-13 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2000-08-15 |
| 6043003 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo | 2000-03-28 |
| 6037097 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo | 2000-03-14 |
| 5919597 | Methods for preparing photoresist compositions | Roger F. Sinta, Uday Kumar, George W. Orsula, James I. T. Fahey, William R. Brunsvold +3 more | 1999-07-06 |