Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10221325 | Ink composition and method for producing printed object | Masakatsu Okawa, Syuji Iwata | 2019-03-05 |
| 7368224 | Photopolymerizable composition | Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Masanori Ikuta, Kyoko Katagi | 2008-05-06 |
| 7358030 | Process for producing ether compound | Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada | 2008-04-15 |
| 7294448 | Composition sensitive to visible light | Katsuhiro Ito, Takeshi Iwasaki, Ikuo Shimizu | 2007-11-13 |
| 7015363 | Process for producing ether compound | Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada | 2006-03-21 |
| 6335141 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura +1 more | 2002-01-01 |
| 6312869 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura +1 more | 2001-11-06 |
| 6245485 | Positive resist composition | Toshiaki Aoai, Shunichi Kondo, Kenichiro Sato | 2001-06-12 |
| 6114462 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura +1 more | 2000-09-05 |
| 6007965 | Photopolymerizable compositions including squarylium compounds | Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito, Hitoshi Kawato | 1999-12-28 |
| 5942367 | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura +1 more | 1999-08-24 |
| 5939235 | Positive-working light-sensitive composition | Syunichi Kondo, Akira Umehara, Yoshimasa Aotani | 1999-08-17 |
| 5882844 | Chemically amplified positive resist composition | Junji Tsuchiya, Toshinobu Ishihara, Shigehiro Nagura, Katsuya Takemura | 1999-03-16 |
| 5876900 | Chemically amplified positive resist composition | Satoshi Watanabe, Toshinobu Ishihara, Shigehiro Nagura | 1999-03-02 |
| 5756258 | Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound | Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito, Hitoshi Kawato | 1998-05-26 |
| 5702872 | Process for resist pattern formation using positive electrodeposition photoresist compositions | Genji Imai, Naozumi Iwasawa | 1997-12-30 |
| 5681685 | Photopolymerizable composition containing squarylium compound | Kenichi Koseki, Ikuo Shimizu, Hiroshi Toyoda, Hirotaka Kinoshita, Shoshiro Matsushita | 1997-10-28 |
| 5650259 | Processes for pattern formation using photosensitive compositions and liquid development | Genji Imai, Naozumi Iwasawa | 1997-07-22 |
| 5527659 | Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound | Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito | 1996-06-18 |
| 5527656 | Positive type electrodeposition photoresist compositions | Genji Imai, Naozumi Iwasawa | 1996-06-18 |
| 5496678 | Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator | Genji Imai, Naozumi Iwasawa | 1996-03-05 |
| 5364738 | Light-sensitive composition | Shunichi Kondo, Akira Umehara, Yoshimasa Aotani | 1994-11-15 |
| 5320931 | Light-sensitive composition | Akira Umehara, Syunichi Kondo | 1994-06-14 |
| 5283265 | Photopolymerizable rubber | Tetsuya Kimura, Syuno Suto, Fujii Toshihiro, Toshihiro Fujii, Kimio Mori | 1994-02-01 |
| 5250385 | Photopolymerizable composition | Syunichi Kondo, Yoshimasa Aotani, Akira Umehara | 1993-10-05 |