Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5202216 | Positive working photosensitive composition | Yoshimasa Aotani, Akira Umehara | 1993-04-13 |
| 5053314 | Positively photosensitive polyimide composition | Amane Mochizuki, Kazumasa Igarashi, Toshihiko Omote | 1991-10-01 |
| 4877714 | Photosensitive aqueous emulsion resin composition of polystyrene or styrene copolymer particles containing photosensitive material | Tahahiro Tsunoda, Seiji Arimatsu | 1989-10-31 |
| 4564580 | Photosensitive resin composition | Kunihiro Ichimura, Sadayoshi Kaneda, Toru Shibuya | 1986-01-14 |
| 4529783 | Novel copolymer and photosensitive material containing the same | Takahiro Tsunoda, Akira Ohmori, Nobuyuki Tomihashi, Sinji Tamaru | 1985-07-16 |
| 4515886 | Photosensitive compositions | Mitsutoshi Fukuda | 1985-05-07 |
| 4474868 | Photo polymerization initiator compositions having high sensitivity | Kenichi Koseki, Yoshitaka Goto | 1984-10-02 |
| 4424325 | Photosensitive material | Takahiro Tsunoda, Sinji Tamura | 1984-01-03 |
| 4365049 | Fluoroalkyl acrylate copolymer and composition containing the same | Takahiro Tsunoda, Sinji Tamaru | 1982-12-21 |