Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5939235 | Positive-working light-sensitive composition | Syunichi Kondo, Akira Umehara, Tsuguo Yamaoka | 1999-08-17 |
| 5721288 | Photopolymerizable composition including a photopolymerization initiation system having excellent light sensitivity to visible light | Tadahiro Sorori | 1998-02-24 |
| 5370965 | Positive-working light-sensitive composition containing diazonium salt and novolak resin | Shunichi Kondo, Mitsumasa Tsuchiya, Sadao Ishige, Takekatsu Sugiyama, Toshifumi Inno | 1994-12-06 |
| 5364738 | Light-sensitive composition | Shunichi Kondo, Akira Umehara, Tsuguo Yamaoka | 1994-11-15 |
| 5358824 | Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring | Shiro Tan, Yasunori Takata, Fumiyuki Nishiyama | 1994-10-25 |
| 5250385 | Photopolymerizable composition | Syunichi Kondo, Akira Umehara, Tsuguo Yamaoka | 1993-10-05 |
| 5202216 | Positive working photosensitive composition | Akira Umehara, Tsuguo Yamaoka | 1993-04-13 |
| 4904563 | Microcapsules and light-sensitive recording material using the same | Toshiaki Aoai | 1990-02-27 |
| 4902602 | Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group | Hiroshi Misu, Koichiro Aono | 1990-02-20 |
| 4876173 | Photopolymerizable composition on polyethylene terephthalate film support | Kazuo Maemoto, Masayuki Iwasaki, Minoru Maeda | 1989-10-24 |
| 4842986 | Positively working resist material | Nobuaki Matsuda, Tadayoshi Kokubo, Toshiaki Aoai, Akira Umehara | 1989-06-27 |
| 4837128 | Light-sensitive composition | Kouichi Kawamma, Yukio Abe, Tatsuji Higashi | 1989-06-06 |
| 4772534 | Light sensitive composition containing a light sensitive s-triazine compound | Kouichi Kawamura, Hirokazu Kondo | 1988-09-20 |
| 4642283 | Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution | Hiroshi Takahashi, Yasuhisa Narutomi, Keisuke Shiba | 1987-02-10 |
| 4636459 | Photopolymerizable compositions | Kouichi Kawamura, Akira Umehara, Seiji Horie | 1987-01-13 |
| 4555474 | Photopolymerizable composition | Kouichi Kawamura, Akira Umehara | 1985-11-26 |
| 4542085 | Negative working diazo light-sensitive composition with oxonol dye and lithographic printing plate using the same | Hiroshi Takahashi, Akira Nishioka, Fumihiro Tokunaga, Koichiro Aono | 1985-09-17 |
| 4505793 | Photopolymerizable compositions | Koji Tamoto, Akira Umehara, Teruo Nagano, Masayuki Iwasaki | 1985-03-19 |
| 4497888 | Light-sensitive o-quinonediazide printing plate with oxonol dye | Akira Nishioka, Kotaro Yamasue | 1985-02-05 |
| 4483918 | Color photographic light-sensitive material | Nobuo Sakai, Yoshiharu Yabuki, Nobuo Furutachi | 1984-11-20 |
| 4359524 | Heat developable photosensitive material | Takao Masuda, Itsuo Fujiwara, Isamu Itoh | 1982-11-16 |
| 4356247 | Light-sensitive compositions | Teruo Kojima, Eiji Nakakita | 1982-10-26 |
| 4271251 | Photosensitive compositions | Hiroshi Misu, Akira Nagashima | 1981-06-02 |