Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5756267 | Developing solution for negative type photosensitive resin compositions | Kesanao Kobayashi | 1998-05-26 |
| 5308743 | Positive image-forming process utilizing glass substrate with oxide film of indium-tin alloy, coated with o-quinonediazide photoresist, with etching of the oxide film in the imagewise exposed areas | Kesanao Kobayashi | 1994-05-03 |
| 4842986 | Positively working resist material | Tadayoshi Kokubo, Toshiaki Aoai, Akira Umehara, Yoshimasa Aotani | 1989-06-27 |