Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7179358 | Method for forming electrodeposition coating film | Akira Tominaga, Koji Kamikado, Yasuyuki Hirata, Susumu Midogochi | 2007-02-20 |
| 5702872 | Process for resist pattern formation using positive electrodeposition photoresist compositions | Genji Imai, Tsuguo Yamaoka | 1997-12-30 |
| 5650259 | Processes for pattern formation using photosensitive compositions and liquid development | Genji Imai, Tsuguo Yamaoka | 1997-07-22 |
| 5624781 | Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition | Keisuke Naruse, Yukari Takeda, Hideo Kogure | 1997-04-29 |
| 5591562 | Water and acid developable photoresist composition exhibiting improved adhesion | Nobuo Komatsu, Ikuyo Kai, Nami Konishi, Satoru Furusawa | 1997-01-07 |
| 5576148 | Process for production of printed circuit board | Genji Imai, Yukari Takeda, Hideo Kogure | 1996-11-19 |
| 5527656 | Positive type electrodeposition photoresist compositions | Genji Imai, Tsuguo Yamaoka | 1996-06-18 |
| 5518859 | Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate | Junichi Higashi | 1996-05-21 |
| 5496678 | Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator | Genji Imai, Tsuguo Yamaoka | 1996-03-05 |
| 5492968 | Resin compositions and a method of curing the same | Noboru Nakai, Osamu Isozaki | 1996-02-20 |
| 5455116 | Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method | Toshiaki Nagano, Hideo Kogure, Tetsu Maki | 1995-10-03 |
| 5455117 | Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method | Toshiaki Nagano, Hideo Kogure, Tetsu Maki | 1995-10-03 |
| 5453328 | Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method | Toshiaki Nagano, Hideo Kogure, Tetsu Maki | 1995-09-26 |
| 5439774 | Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit | Junichi Higashi | 1995-08-08 |
| 5422222 | Electrodeposition coating composition | Yuw Akaki, Junichi Higashi | 1995-06-06 |
| 5389727 | Resin compositions and a method of curing the same | Noboru Nakai, Osamu Isozaki | 1995-02-14 |
| 5370971 | Epoxy based photopolymerizable composition | Tetsuo Ogawa, Kenji Seko, Tetsu Maki | 1994-12-06 |
| 5344740 | Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same | Junichi Higashi, Shinsuke Onishi | 1994-09-06 |
| 5284919 | Resin compositions and a method of curing the same | Noboru Nakai, Osamu Isozaki | 1994-02-08 |
| 5281449 | Method of forming pattern coatings based on a radiation curable composition which contains a resin having both thioether and carboxyl groups | Hideo Kogure, Heihachi Murase | 1994-01-25 |
| 5262242 | Colored films for use in vacuum forming | Takeshi Tomiyama, Sadaaki Hashimoto, Kazuhisa Koizumi | 1993-11-16 |
| 5236810 | Process for preparing printed-circuit board | Toshio Kondo, Shinsuke Onishi, Sadaaki Hashimoto | 1993-08-17 |
| 5216094 | Resins with unsaturated carbonyl and hydroxyl groups | Osamu Isozaki | 1993-06-01 |
| 5196487 | Corrosion preventive resin and photopolymerizable composition incorporating same | Hideo Kogure, Heihachi Murase | 1993-03-23 |
| 5134054 | Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate | Junichi Higashi | 1992-07-28 |