HK

Hideo Kogure

KC Kansai Paint Co.: 24 patents #9 of 822Top 2%
MC Mitsui Chemicals: 1 patents #1,270 of 2,279Top 60%
Overall (All Time): #165,672 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
6881254 Coating material for inorganic-film formation and method of forming inorganic film from the coating material Jun Akui, Osamu Isozaki 2005-04-19
6699646 Positive type photosensitive resin composition and method for forming resist pattern Genji Imai 2004-03-02
6664029 Method of forming pattern Genji Imai, Kengo Ohnishi, Hiroyuki Honma 2003-12-16
6660457 Method of forming conductive pattern Genji Imai, Daisuke Kojima 2003-12-09
6420090 Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same Daisuke Kojima, Genji Imai, Jun Akui, Osamu Isozaki 2002-07-16
6344307 Photosensitive resin composition Daisuke Kojima, Osamu Isozaki, Genji Imai 2002-02-05
6331376 Organic-solvent-based photocurable resist composition and resist pattern-forming method Daisuke Kojima, Genji Imai, Jun Akui, Osamu Isozaki 2001-12-18
6187509 Positive type electrodeposition photoresist compositions and pattern formation process Genji Imai, Takeya Hasegawa 2001-02-13
6140025 Negative type photosensitive resin composition and method for forming resist pattern Genji Imai 2000-10-31
6124077 Visible light-sensitive compositions and pattern formation process Genji Imai 2000-09-26
6106999 Photosensitizer, visible light curable resin composition using the same, and use of the composition Akira Ogiso, Tsutami Misawa, Taizo Nishimoto, Hisashi Tsukahara, Keisuke Takuma +3 more 2000-08-22
6093518 Visible laser-curable composition Genji Imai 2000-07-25
6054251 Photopolymerizable composition Genji Imai 2000-04-25
5939148 Visible laser-curable composition Genji Imai 1999-08-17
5624781 Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition Keisuke Naruse, Yukari Takeda, Naozumi Iwasawa 1997-04-29
5576148 Process for production of printed circuit board Genji Imai, Yukari Takeda, Naozumi Iwasawa 1996-11-19
5455117 Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method Toshiaki Nagano, Naozumi Iwasawa, Tetsu Maki 1995-10-03
5455116 Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method Toshiaki Nagano, Tetsu Maki, Naozumi Iwasawa 1995-10-03
5453328 Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method Toshiaki Nagano, Naozumi Iwasawa, Tetsu Maki 1995-09-26
5443900 Electromagnetic wave absorber Toshiaki Nagano, Heihachi Murase 1995-08-22
5342901 Film-formable, chelate-forming resin, process for preparation thereof, use thereof and method for forming electrophoretic coating Heihachi Murase, Masafumi Kume 1994-08-30
5281449 Method of forming pattern coatings based on a radiation curable composition which contains a resin having both thioether and carboxyl groups Naozumi Iwasawa, Heihachi Murase 1994-01-25
5196487 Corrosion preventive resin and photopolymerizable composition incorporating same Heihachi Murase, Naozumi Iwasawa 1993-03-23
5188750 Anti-icing composition and method of preventing icing Heihachi Murase, Koichi Tamura 1993-02-23
5032641 Water-repellent film-forming composition Kiyoshi Nanishi, Heihachi Murase 1991-07-16