Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7649027 | Polymer and process for producing polymer | — | 2010-01-19 |
| 7544461 | Near infrared ray activation type positive resin composition | Toshikazu Murayama, Katsuhiro Ito, Haruhumi Hagino | 2009-06-09 |
| 7466893 | Curable resin composition for light guide formation, curable dry film for light guide formation, cured resin and light guide | Takahiro Higuchi | 2008-12-16 |
| 7431850 | Process for purification treatment of wastewater containing organic substance | Naonori Miyata, Takeshi Sako, Izumi Okajima | 2008-10-07 |
| 7416707 | Polymerization reaction apparatus, and method of producing polymer using this apparatus | — | 2008-08-26 |
| 7310467 | Method of fabricating optical waveguide | — | 2007-12-18 |
| 7081486 | Method of producing polymer | Takeshi Sako | 2006-07-25 |
| 7078158 | Composition for activation energy rays and method of forming pattern | Chiaki Iwashima, Takeya Hasegawa | 2006-07-18 |
| 6946234 | Positive sensitive resin composition and a process for forming a resist pattern therewith | Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto | 2005-09-20 |
| 6913867 | Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern | — | 2005-07-05 |
| 6884570 | Positive type actinic ray-curable dry film and pattern-forming method by use of the same | Takeya Hasegawa | 2005-04-26 |
| 6864035 | Positive photosensitive resin composition, positive photosensitive dry film and method of forming pattern | — | 2005-03-08 |
| 6699646 | Positive type photosensitive resin composition and method for forming resist pattern | Hideo Kogure | 2004-03-02 |
| 6670100 | Positive type actinic ray-curable dry film and pattern-forming method by use of the same | Takeya Hasegawa | 2003-12-30 |
| 6664029 | Method of forming pattern | Kengo Ohnishi, Hiroyuki Honma, Hideo Kogure | 2003-12-16 |
| 6660457 | Method of forming conductive pattern | Hideo Kogure, Daisuke Kojima | 2003-12-09 |
| 6630285 | Positive sensitive resin composition and a process for forming a resist pattern therewith | Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto | 2003-10-07 |
| 6555286 | Positive type actinic-ray-curable dry film and pattern-forming method by use of the same | Takeya Hasegawa | 2003-04-29 |
| 6420090 | Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same | Daisuke Kojima, Jun Akui, Hideo Kogure, Osamu Isozaki | 2002-07-16 |
| 6344307 | Photosensitive resin composition | Daisuke Kojima, Osamu Isozaki, Hideo Kogure | 2002-02-05 |
| 6331376 | Organic-solvent-based photocurable resist composition and resist pattern-forming method | Daisuke Kojima, Jun Akui, Hideo Kogure, Osamu Isozaki | 2001-12-18 |
| 6187509 | Positive type electrodeposition photoresist compositions and pattern formation process | Hideo Kogure, Takeya Hasegawa | 2001-02-13 |
| 6140025 | Negative type photosensitive resin composition and method for forming resist pattern | Hideo Kogure | 2000-10-31 |
| 6124077 | Visible light-sensitive compositions and pattern formation process | Hideo Kogure | 2000-09-26 |
| 6106999 | Photosensitizer, visible light curable resin composition using the same, and use of the composition | Akira Ogiso, Tsutami Misawa, Taizo Nishimoto, Hisashi Tsukahara, Keisuke Takuma +3 more | 2000-08-22 |