Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5102775 | Visible light sensitive electrodeposition coating composition and image-forming method using the same | Motoko Okuhara, Ichiro Yoshihara, Yasuo Doi, Takao Yamamoto, Kenji Seko +1 more | 1992-04-07 |
| 5096936 | Photo-crosslinkable resin composition | Kenji Seko, Satoshi Watanabe | 1992-03-17 |
| 5093223 | Method of forming a cured coating film | Osamu Isozaki | 1992-03-03 |
| 5070000 | Electrodeposition coating composition for use in printed circuit board photo resist | Kenji Seko, Yuu Akaki, Toshio Kondo | 1991-12-03 |
| 5045434 | Visible radiation sensitive composition containing substituted 3-(benzothiazo-2-yl)-7-diethylaminocoumarin as sensitizers | Ichiro Yoshihara, Motoko Okuhara, Takao Yamamoto, Yasuo Doi, Tsukasa Ohyama +5 more | 1991-09-03 |
| 5026793 | Resin compositions and a method of curing the same | Noboru Nakai, Osamu Isozaki | 1991-06-25 |
| 5015472 | Coating compositions and methods for preventing adhesion of organisms | Osamu Isozaki, Toshiro Hirama, Hiroshi Iwai | 1991-05-14 |
| 5002977 | Active energy ray-curable unsaturated resin composition | Kenji Seko | 1991-03-26 |
| 4975351 | Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer | Yuu Akaki, Kenji Seko, Toshio Kondo | 1990-12-04 |
| 4973477 | Coating compositions for preventing adhesion of organisms | Osamu Isozaki, Toshiro Hirama, Hiroshi Iwai | 1990-11-27 |
| 4927884 | Curable composition | Osamu Isozaki, Noboru Nakai | 1990-05-22 |
| 4923930 | Curable resin and resin composition curable at low temperature | Osamu Isozaki | 1990-05-08 |
| 4904504 | Method of preventing adhesion of organisms | Osamu Isozaki | 1990-02-27 |
| 4898656 | Electrodeposition coating process of photoresist for printed circuit board | Masahiro Hoshino, Isao Kobayashi, Kenji Seko, Yuu Akaki, Toshio Kondo | 1990-02-06 |
| 4329266 | Water-dispersed coating composition comprising an acrylic graft polymer containing carboxyl groups, hydroxyl and/or amide groups | Yukio Suzuki, Tadashi Watanabe | 1982-05-11 |