Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4590149 | Method for fine pattern formation on a photoresist | Hisashi Nakane, Akira Yokota, Mitsuo Yabuta, Wataru Ishii | 1986-05-20 |
| 4401745 | Composition and process for ultra-fine pattern formation | Hisashi Nakane, Wataru Kanai | 1983-08-30 |
| 4297433 | Light sensitive compositions of polymethyl isopropenyl ketone | Yoichi Nakamura | 1981-10-27 |
| 4276369 | Photo--imaging a polymethyl isopropenyl ketone (PMIPK) composition | Yoichi Nakamura | 1981-06-30 |
| 4243740 | Light sensitive compositions of polymethyl isopropenyl ketone | Yoichi Nakamura, Hideo Nagata, Hisashi Nakane | 1981-01-06 |