Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5738968 | Positive photoresist composition | Taku Hirayama, Kousuke Doi, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1998-04-14 |
| 5728504 | Positive photoresist compositions and multilayer resist materials using the same | Satoshi Niikura, Atsushi Sawano, Tatsuya Hashiguchi, Kazuyuki Nitta, Hidekatsu Kohara +1 more | 1998-03-17 |
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Remi Numata, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-26 |
| 5401605 | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Kousuke Doi, Kouichi Takahashi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-03-28 |
| 5223688 | Fluid level adjusting apparatus in an electric discharge machining tank | Toshiyuki Aso | 1993-06-29 |
| 4880957 | Wire-cut electrical discharge machine with electric shock preventer | Toshiyuki Aso | 1989-11-14 |