Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern | Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani +3 more | 2008-04-15 |
| 7060410 | Novolak resin solution, positive photoresist composition and preparation method thereof | Hiroyuki Ohnishi, Yusuke Nakagawa | 2006-06-13 |
| 6964838 | Positive photoresist composition | Masaki Kurihara, Takako Suzuki, Kenji Maruyama, Satoshi Niikura | 2005-11-15 |
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama | 2005-09-06 |
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Hidekatsu Kohara | 2005-04-26 |
| 6869742 | Positive photoresist composition | Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura | 2005-03-22 |
| 6762005 | Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process | Akira Katano, Yusuke Nakagawa, Shinichi Kono | 2004-07-13 |
| 6756178 | Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process | Akira Katano, Yusuke Nakagawa, Shinichi Kono | 2004-06-29 |
| 6566031 | Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern | Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 2003-05-20 |
| 6517993 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Hidekatsu Kohara | 2003-02-11 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Ken Miyagi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama | 2002-11-05 |
| 6417317 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Ryuusaku Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 2002-07-09 |
| 6406827 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 2002-06-18 |
| 6379859 | Positive photoresist composition and process for forming resist pattern using same | Takako Suzuki, Sachiko Tamura, Hidekatsu Kohara, Toshimasa Nakayama | 2002-04-30 |
| 6312863 | Positive photoresist composition | Shinichi Hidesaka, Atsushi Sawano, Hidekatsu Kohara, Toshimasa Nakayama | 2001-11-06 |
| 6300033 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 2001-10-09 |
| 6296992 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-10-02 |
| 6207340 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-03-27 |
| 6207788 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Ryuusaku Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-03-27 |
| 6187500 | Positive photoresist compositions and multilayer resist materials using same | Ken Miyagi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama | 2001-02-13 |
| 6177226 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-01-23 |
| 6127087 | Positive photoresist compositions and multilayer resist materials using same | Miki Kobayashi, Sachiko Tamura, Hidekatsu Kohara, Toshimasa Nakayama | 2000-10-03 |
| 6120969 | Polyphenol compound, quinonediazide ester and positive photoresist composition | Mitsuo Hagihara, Hidekatsu Kohara, Toshimasa Nakayama, Tetsuya Nakajima | 2000-09-19 |
| 6030741 | Positive resist composition | Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 2000-02-29 |
| 5853948 | Positive photoresist compositions and multilayer resist materials using the same | Atsushi Sawano, Junichi Mizuta, Hidekatsu Kohara, Toshimasa Nakayama | 1998-12-29 |