Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10678129 | Composition for nanoimprint, cured product, pattern forming method, and article having pattern | — | 2020-06-09 |
| 9929311 | Semiconductor light emitting element and method for producing the same | Yukio Kashima, Eriko Matsuura, Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa +5 more | 2018-03-27 |
| 9929317 | Deep ultraviolet LED and method for manufacturing the same | Yukio Kashima, Eriko Matsuura, Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa +5 more | 2018-03-27 |
| 9806229 | Deep ultraviolet LED and method for manufacturing the same | Yukio Kashima, Eriko Matsuura, Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa +3 more | 2017-10-31 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern | Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Masahiro Masujima +3 more | 2008-04-15 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern | Yusuke Nakagawa, Shinichi Hidesaka, Kenji Maruyama, Masahiro Masujima, Kazuyuki Nitta | 2008-02-12 |
| 7192687 | Positive resist composition and method of forming resist pattern using same | Kazuyuki Nitta, Waki Ohkubo | 2007-03-20 |
| 7150956 | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | Kazuyuki Nitta, Takeyoshi Mimura, Waki Okubo, Tatsuya Matsumi | 2006-12-19 |
| 6921621 | Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device | Kazuyuki Nitta, Takeyoshi Mimura, Waki Okubo, Tatsuya Matsumi | 2005-07-26 |
| 6787290 | Positive-working photoresist composition and resist patterning method using same | Kazuyuki Nitta, Kazufumi Sato, Daisuke Kawana | 2004-09-07 |
| 6620978 | Positive photoresist composition and process for synthesizing polyphenol compound | Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 2003-09-16 |
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 2002-12-10 |