Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11780946 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | Akiyoshi Yamazaki, Yoshitaka Komuro, Masatoshi Arai, Nobuhiro MICHIBAYASHI, Takatoshi Inari | 2023-10-10 |
| 11747724 | Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method | Kiwamu Sue, Sho KATAOKA, Yusuke YOSHIGOE, Takatoshi Inari, Masatoshi Arai +2 more | 2023-09-05 |
| 11560444 | Method of producing block copolymer capable of creating specific structure pattern | Teruaki Hayakawa, Seina Yamazaki, Akiyoshi Yamazaki, Yoshitaka Komuro, Takaya Maehashi +1 more | 2023-01-24 |
| 11472956 | Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer | Teruaki Hayakawa, Lei DONG, Takahiro Dazai, Ken Miyagi, Takayoshi Mori | 2022-10-18 |
| 11261299 | Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure | Akiyoshi Yamazaki, Takehiro Seshimo, Teruaki Hayakawa, Lei DONG, Rin Odashima | 2022-03-01 |
| 10941253 | Block copolymer, and method of producing structure containing phase-separated structure | Teruaki Hayakawa, Seina Yamazaki, Rin Odashima, Takehiro Seshimo, Akiyoshi Yamazaki | 2021-03-09 |
| 10324377 | Resist composition and method of forming resist pattern | Taku Hirayama, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki +2 more | 2019-06-18 |
| 10101658 | Resist composition and method of forming resist pattern | Taku Hirayama, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Masahito Yahagi +1 more | 2018-10-16 |
| 9766541 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | Hiroto Yamazaki, Yoshitaka Komuro, Masatoshi Arai, Kenta Suzuki, Tatsuya Fujii | 2017-09-19 |
| 9057948 | Resist composition for EUV or EB, and method of forming resist pattern | Jun Iwashita, Kenri Konno, Tatsuya Fujii, Kenta Suzuki | 2015-06-16 |
| 8227169 | Compound, acid generator, resist composition, and method of forming resist pattern | Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Kotaro Endo +2 more | 2012-07-24 |
| 8216763 | Photosensitive resin composition and method of forming pattern | Kazufumi Sato, Yasushi Fujii, Hisanobu Harada, Koji Yonemura, Isamu Takagi +2 more | 2012-07-10 |
| 7785768 | Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom | Yasushi Fujii, Hisanobu Harada, Naoki Yamashita | 2010-08-31 |
| 7666569 | Positive resist composition and method for forming resist pattern | Kazufumi Sato, Mitsuo Hagihara | 2010-02-23 |
| 7416832 | Positive resist composition | Tomotaka Yamada, Takayuki Hosono, Koki Tamura | 2008-08-26 |
| 7318992 | Lift-off positive resist composition | Tomotaka Yamada, Hiroshi Shimbori, Koki Tamura, Tomoyuki Ando, Takayuki Hosono | 2008-01-15 |
| 7261994 | Positive resist composition | Takayuki Hosono, Koki Tamura, Tomotaka Yamada | 2007-08-28 |
| 6787290 | Positive-working photoresist composition and resist patterning method using same | Kazuyuki Nitta, Kazufumi Sato, Satoshi Shimatani | 2004-09-07 |