Issued Patents All Time
Showing 1–25 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11780948 | Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer | Ken Miyagi, Toshifumi Satoh, Takuya Isono, Shunma Tanaka | 2023-10-10 |
| 11472956 | Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer | Teruaki Hayakawa, Lei DONG, Ken Miyagi, Takayoshi Mori, Daisuke Kawana | 2022-10-18 |
| 11466114 | Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer | Ken Miyagi, Toshifumi Satoh, Takuya Isono | 2022-10-11 |
| 10995234 | Method of producing structure containing phase-separated structure | Hitoshi Yamano, Akiya Kawaue, Ken Miyagi | 2021-05-04 |
| 9690194 | Method of forming resist pattern | Tsuyoshi Nakamura, Masatoshi Arai | 2017-06-27 |
| 9644110 | Method of producing structure containing phase-separated structure and method of forming top coat film | Takehiro Seshimo, Takaya Maehashi, Yoshiyuki Utsumi | 2017-05-09 |
| 9606433 | Resist composition, method of forming resist pattern, polymeric compound and compound | Yoshiyuki Utsumi, Masatoshi Arai, Yoshitaka Komuro | 2017-03-28 |
| 9567477 | Undercoat agent and method of producing structure containing phase-separated structure | Takehiro Seshimo, Tasuku Matsumiya, Takaya Maehashi, Yoshiyuki Utsumi | 2017-02-14 |
| 9442371 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | Takehiro Seshimo, Takaya Maehashi, Yoshiyuki Utsumi, Tasuku Matsumiya, Ken Miyagi +2 more | 2016-09-13 |
| 9383642 | Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern | Masatoshi Arai, Yoshiyuki Utsumi | 2016-07-05 |
| 9206307 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | Tasuku Matsumiya, Takehiro Seshimo, Ken Miyagi, Takaya Maehashi, Yoshiyuki Utsumi | 2015-12-08 |
| 9188869 | Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern | Takehiro Seshimo, Takaya Maehashi, Ken Miyagi, Yoshiyuki Utsumi | 2015-11-17 |
| 9122157 | Resist composition and method for forming resist pattern | Masatoshi Arai, Yoshiyuki Utsumi | 2015-09-01 |
| 9097971 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno | 2015-08-04 |
| 9051648 | Substrate provided with metal nanostructure on surface thereof and method of producing the same | Shigenori Fujikawa, Mari Koizumi, Takahiro Senzaki, Ken Miyagi | 2015-06-09 |
| 9023580 | Method of forming polymeric compound, resist composition and method of forming resist pattern | Daiju Shiono, Tomoyuki Hirano | 2015-05-05 |
| 8999631 | Primer and pattern forming method for layer including block copolymer | Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi | 2015-04-07 |
| 8987386 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | Yoshiyuki Utsumi, Masatoshi Arai, Takaaki Kaiho | 2015-03-24 |
| 8846838 | Fluorine-containing block copolymeric compound | Tasuku Matsumiya, Daiju Shiono, Tomoyuki Hirano | 2014-09-30 |
| 8795948 | Resist composition, method of forming resist pattern and polymeric compound | Yoshiyuki Utsume, Jun Iwashita, Kensuke Matsuzawa, Kenri Konno | 2014-08-05 |
| 8742038 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Daiju Shiono, Sanae Furuya, Tomoyuki Hirano, Takayoshi Mori | 2014-06-03 |
| 8642244 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Daiju Shiono, Sanae Furuya, Tomoyuki Hirano, Takayoshi Mori | 2014-02-04 |
| 8632960 | Method of forming resist pattern and negative tone-development resist composition | Tomoyuki Hirano, Daiju Shiono, Sho Abe | 2014-01-21 |
| 8541529 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya | 2013-09-24 |
| 8487056 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya, Daiju Shiono, Tomoyuki Hirano, Kotaro Endo | 2013-07-16 |