Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8475997 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | Daiju Shiono, Tomoyuki Hirano, Sanae Furuya, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more | 2013-07-02 |
| 8404428 | Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound | Tasuku Matsumiya, Daiju Shiono, Tomoyuki Hirano | 2013-03-26 |
| 8404426 | Negative resist composition, method of forming resist pattern and polymeric compound | Sho Abe, Daiju Shiono, Tomoyuki Hirano | 2013-03-26 |
| 8394578 | Method of forming resist pattern and negative tone-development resist composition | Tomoyuki Hirano, Daiju Shiono | 2013-03-12 |
| 8367296 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya | 2013-02-05 |
| 8329378 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono | 2012-12-11 |
| 8323869 | Positive resist composition and method of forming resist pattern | Hiroaki Shimizu, Hideto Nito, Junichi Tsuchiya | 2012-12-04 |
| 8298745 | Polymeric compound, positive resist composition, and method of forming resist pattern | Sanae Furuya, Shinichi Kohno | 2012-10-30 |
| 8268529 | Positive resist composition, method of forming resist pattern using the same, and polymeric compound | Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Masaru Takeshita | 2012-09-18 |
| 8236477 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya, Daiju Shiono, Tomoyuki Hirano, Kotaro Endo | 2012-08-07 |
| 8232041 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono | 2012-07-31 |
| 8227170 | Resist composition, method of forming resist pattern, polymeric compound, and compound | Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori +1 more | 2012-07-24 |
| 8221956 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound | Daiju Shiono, Tomoyuki Hirano, Sanae Furuya, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more | 2012-07-17 |
| 8206891 | Positive resist composition and method of forming resist pattern | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Tomoyuki Hirano, Fumitake Kaneko +1 more | 2012-06-26 |
| 8192915 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya | 2012-06-05 |
| 8182976 | Positive resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya | 2012-05-22 |
| 8105749 | Polymer compound, positive resist composition, and method of forming resist pattern | Takayoshi Mori, Hiroaki Shimizu, Kyoko Ohshita | 2012-01-31 |
| 8088553 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Takayoshi Mori, Sanae Furuya, Daiju Shiono +1 more | 2012-01-03 |
| 8021823 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Daiju Shiono, Tomoyuki Hirano | 2011-09-20 |
| 7989138 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Ryoichi Takasu, Tomoyuki Hirano | 2011-08-02 |
| 7960089 | Compound, method for producing same, positive resist composition and method for forming resist pattern | Daiju Shiono, Taku Hirayama, Kohei KASAI, Hideo Hada | 2011-06-14 |
| 7960091 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura | 2011-06-14 |
| 7919651 | Positive resist composition, method of forming resist pattern, polymeric compound, and compound | Daiju Shiono, Hiroaki Shimizu | 2011-04-05 |
| 7914967 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Ryoichi Takasu, Tomoyuki Hirano | 2011-03-29 |
| 7767379 | Polymer compound, positive resist composition, and method of forming resist pattern | Takayoshi Mori, Hiroaki Shimizu, Kyoko Oshita | 2010-08-03 |